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HCID 58109558, 화합물 → HCID 59635765, 화합물

HRID 2037448
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HRID 2037448 반응식
[F:1][C:2]1[CH:7]=[C:6]([F:8])[CH:5]=[CH:4][C:3]=1[C:9]1[CH:14]=[CH:13][C:12]([C@@H:15]([N:17]2[CH2:22][CH2:21][C@@:20]([C:27]3[CH:32]=[CH:31][C:30]([F:33])=[CH:29][CH:28]=3)([CH2:23][C:24](=[O:26])[CH3:25])[O:19][C:18]2=[O:34])[CH3:16])=[CH:11][CH:10]=1.[CH3:35][Mg+].[Br-]>C1COCC1>[F:1][C:2]1[CH:7]=[C:6]([F:8])[CH:5]=[CH:4][C:3]=1[C:9]1[CH:14]=[CH:13][C:12]([C@@H:15]([N:17]2[CH2:22][CH2:21][C@@:20]([C:27]3[CH:28]=[CH:29][C:30]([F:33])=[CH:31][CH:32]=3)([CH2:23][C:24]([OH:26])([CH3:35])[CH3:25])[O:19][C:18]2=[O:34])[CH3:16])=[CH:11][CH:10]=1
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참가 물질

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반응물 2

HCID 58109558HCID 58109558, 화합물HCID 178418689HCID 178418689, 화합물

생성물 1

HCID 59635765HCID 59635765, 화합물

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매

실험 절차

To a stirred solution of (S)-3-((S)-1-(2′,4′-difluorobiphenyl-4-yl)ethyl)-6-(4-fluorophenyl)-6-(2-oxopropyl)-1,3-oxazinan-2-one (0.0303 g, 0.0648 mmol) in THF (5 mL) was added MeMgBr (1.4 M in toluene/THF, 1 mL, 1.4 mmol) at 0° C. The mixture was warmed to it and stirred for 1 h before quenching with satd aq NH4Cl (1 mL). The mixture was diluted with CH2Cl2 and dried over Na2SO4. After the solvent was evaporated under reduced pressure, the residue was purified by preparative HPLC (SunFire™ Prep C18 OBD™ 5 μm 19×50 mm column, 10%→90% CH3CN/H2O, 0.1% CF3COOH over 8 min and then 90% CH3CN/H2O, 0.1% CF3COOH over 2 min, flow rate 20 mL/min) to afford (S)-3-((S)-1-(2′,4′-difluorobiphenyl-4-yl)ethyl)-6-(4-fluorophenyl)-6-(2-hydroxy-2-methylpropyl)-1,3-oxazinan-2-one. LC-MS Method 1 tR=1.91 min, m/z 484 (MH+), 426; 1H NMR (400 MHz, CD3OD) δ 7.36-7.20 (m, 5H), 7.02-6.92 (m, 6H), 5.52 (q, J=7.0 Hz, 1H), 3.05-3.00 (m, 1H), 2.49-2.35 (m, 2H), 2.22-2.15 (m, 1H), 2.06 (s, 2H), 1.48 (d, J=7.0 Hz, 3H), 1.19 (s, 3H), 0.90 (s, 3H); 19F NMR (376 MHz, CD3OD) δ −113.78 (m), −115.82 (m), −117.50 (m).

후처리

  1. temperatureThe mixture was warmed to it
  2. custombefore quenching with satd aq NH4Cl (1 mL)
  3. additionThe mixture was diluted with CH2Cl2
  4. dry with materialdried over Na2SO4
  5. customAfter the solvent was evaporated under reduced pressure
  6. customthe residue was purified by preparative HPLC (SunFire™ Prep C18 OBD™ 5 μm 19×50 mm column, 10%
  7. customover 8 min
  8. wait90% CH3CN/H2O, 0.1% CF3COOH over 2 min

출처 및 근거

ORD 기록
ord-2d5846e10b16464ab9e8a543de390610
출처 데이터셋
uspto-grants-2013_11
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08575156B2

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