홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

HCID 11586634, 화합물 → HCID 11528683, 화합물

HRID 2053401
노트
인쇄 미리보기

반응식

HRID 2053401 반응식
[CH3:1][C@H:2]([CH2:9][O:10][CH:11]1[CH2:16][CH2:15][CH2:14][CH2:13][O:12]1)[CH2:3][C:4]#[C:5][CH:6]([OH:8])[CH3:7]>C1COCC1.[O-2].[O-2].[Mn+4]>[CH3:1][C@H:2]([CH2:9][O:10][CH:11]1[CH2:16][CH2:15][CH2:14][CH2:13][O:12]1)[CH2:3][C:4]#[C:5][C:6](=[O:8])[CH3:7]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 1

HCID 11586634HCID 11586634, 화합물

생성물 1

HCID 11528683HCID 11528683, 화합물수율 94.1%

시약·촉매·용매 2

HCID 178418406HCID 178418406, 화합물촉매HCID 8028Tetrahydrofuran용매2회

실험 절차

A 300 g (1.3255 mol) solution of (2RS,6S)-6-methyl-7-[(RS)-(3,4,5,6-tetrahydro-2H-pyran-2-yl)oxy]hept-3-in-2-ol, dissolved in 600 ml of THF, is added by stirring to a suspension of 1500 g manganese dioxide in 2250 ml of THF, and stirring is continued at room temperature for 48 hours. The suspension is then filtered over silica gel and the solvent is removed in vacuo. 280 g of the product is obtained.

후처리

  1. additionis added
  2. filtrationThe suspension is then filtered over silica gel
  3. customthe solvent is removed in vacuo

출처 및 근거

ORD 기록
ord-5d2de440f4934a1c861e482e9594be9f
출처 데이터셋
uspto-grants-2008_02
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07326798B2

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트