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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 2055194생성일: 2026년 10월 27일

2-Trimethylsilyl-1,3-dithiane → 2-((3S,5R)-3,5-Dimethyl-cyclohexylidene)-[1,3]dithiane

https://huagongshe.com/reaction/2055194

반응식

참여 물질

역할이름HCID투입량
반응물2-Trimethylsilyl-1,3-dithianeHCID 83413—
반응물AG-G-83630HCID 642498—
반응물ButyllithiumHCID 178418339—
용매TetrahydrofuranHCID 8028—
생성물2-((3S,5R)-3,5-Dimethyl-cyclohexylidene)-[1,3]dithianeHCID 6922382892%

반응 조건

온도-78 °C

반응 단계

To a solution of 2-trimethylsilyl-1,3-dithiane (30.1 g, 0.16 mol) in THF (250 mL) at 0° C. under an argon atmosphere was added a solution of n-butyl lithium (2.5 M in hexanes, 64 mL, 0.16 mol) and the mixture was cooled to −78° C. A solution of cis-3,5-dimethyl cyclohexanone (10 g, 0.079 mol) in THF (30 mL) was added over 10 min. After 3.5 h the reaction mixture was quenched with saturated aqueous NH4Cl solution (100 mL). The aqueous phase was extracted with EtOAc (100 mL×4) and the combined organic layers were dried (MgSO4) and were evaporated. The reaction by-products were removed by vacuum distillation to yield the desired product (16.6 g, 92%). MH+229

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US07332485B2
출처 데이터셋uspto-grants-2008_02
ORD IDord-43478b8b990d4b0d97a83e09af221f91
출처 메모uspto-grants-2008_02