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llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
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Vinyl Acetate → Tetraethylsilane

HRID 20614
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HRID 20614 반응식
[CH2:1]([SiH:3]([CH2:6][CH3:7])[CH2:4][CH3:5])[CH3:2].C(OC=C)(=[O:10])C.[CH:14]([Si:16]([CH2:21][CH3:22])([CH2:19][CH3:20])[CH2:17][CH3:18])=[CH2:15]>C1(C)C=CC=CC=1>[CH2:14]([Si:16]([CH2:21][CH3:22])([CH2:19][CH3:20])[CH2:17][CH3:18])[CH3:15].[CH2:1]([Si:3]([CH2:6][CH3:7])([CH2:4][CH3:5])[OH:10])[CH3:2]
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참가 물질

6

반응물 3

HCID 7904Vinyl AcetateHCID 12052TriethylsilaneHCID 559195Ethenyltriethylsilane

생성물 2

HCID 12426TetraethylsilaneHCID 69005Triethylsilanol

시약·촉매·용매 1

HCID 1140Toluene용매

실험 절차

In a reactor were placed triethylsilane (Et3SiH) (5 mmol), di-μ-chlorobis(1,5-cyclooctadiene)diiridium(I) [IrCl(cod)]2 (0.05 mmol), vinyl acetate (20 mmol), and toluene (3 ml), and a reaction was conducted at 40° C. in a nitrogen atmosphere for one hour. After the reaction, the reaction mixture was analyzed by gas chromatography to find that vinyltriethylsilane was produced in a yield of 20%, and tetraethylsilane and acetic ester of triethylsilanol were by-produced in yields of 9% and 14%, respectively.

후처리

  1. customIn a reactor were placed
  2. customAfter the reaction

출처 및 근거

ORD 기록
ord-777aa9d068ad45cdbc6fcd5c4887e0cc
출처 데이터셋
uspto-grants-2010_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07745654B2

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