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llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
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Vinyl Acetate → Tetraethylsilane

HRID 20615
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HRID 20615 반응식
C(OC=C)(=[O:3])C.[CH2:7]([SiH:9]([CH2:12][CH3:13])[CH2:10][CH3:11])[CH3:8].[CH:14]([Si:16]([CH2:21][CH3:22])([CH2:19][CH3:20])[CH2:17][CH3:18])=[CH2:15]>C1(C)C=CC=CC=1>[CH2:14]([Si:16]([CH2:21][CH3:22])([CH2:19][CH3:20])[CH2:17][CH3:18])[CH3:15].[CH2:7]([Si:9]([CH2:12][CH3:13])([CH2:10][CH3:11])[OH:3])[CH3:8]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 3

HCID 7904Vinyl AcetateHCID 12052TriethylsilaneHCID 559195Ethenyltriethylsilane

생성물 2

HCID 12426TetraethylsilaneHCID 69005Triethylsilanol

시약·촉매·용매 1

HCID 1140Toluene용매

실험 절차

In a reactor were placed di-μ-chlorobis(1,5-cyclooctadiene)diiridium(I) [IrCl(cod)]2 (0.05 mmol), vinyl acetate (20 mmol), and toluene (3 ml). The mixture was raised in temperature to 40° C. in a nitrogen atmosphere, triethylsilane (Et3SiH) (5 mmol) was added thereto over one hour, and a reaction was carried out at 40° C. for one hour. After the reaction, the reaction mixture was analyzed by gas chromatography to find that vinyltriethylsilane was produced in a yield of 36% and tetraethylsilane and acetic ester of triethylsilanol were by-produced in yields of 7% and 12%, respectively.

후처리

  1. customIn a reactor were placed
  2. additionwas added
  3. waita reaction was carried out at 40° C. for one hour
  4. customAfter the reaction

출처 및 근거

ORD 기록
ord-c37ee7496bef4a1ba95597d93832f390
출처 데이터셋
uspto-grants-2010_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07745654B2

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