Nitric Acid → 2,3,6-Trimethyl-4-nitrophenol

HRID 2103060노트

반응식

HRID 2103060 반응식
ClC1C=CC(N2[C:17]3[C:12](=[C:13]([CH3:21])[C:14]([OH:20])=[C:15]([CH3:19])[C:16]=3C)[CH2:11]C3(CCC3)C2)=CC=1.[N+:25]([O-:28])(O)=[O:26]>C(O)(=O)C>[CH3:21][C:13]1[C:12]([CH3:11])=[C:17]([N+:25]([O-:28])=[O:26])[CH:16]=[C:15]([CH3:19])[C:14]=1[OH:20]

참가 물질

4

반응물 2

HCID 944Nitric AcidHCID 116242921'-(4-Chlorophenyl)-5',7',8'-trimethyl-1',4'-dihydro-2'H-spiro[cyclobutane-1,3'-quinolin]-6'-ol

생성물 1

HCID 133312472,3,6-Trimethyl-4-nitrophenol

시약·촉매·용매 1

HCID 176Acetic Acid용매2회

실험 절차

2,3,6-trimethyl phenol 1 (19.1 g) was dissolved in acetic acid (190 mL). This solution was added to an acetic acid solution of HNO3 (150 mL, 1M) at room temperature in 4.5 hours. After another 0.5 hour, the mixture was evaporated, and the residue was taken up by EtOAc (350 mL). This solution was washed with water (150 mL×2), and brine (150 mL), dried and evaporated. Elution on a silica column (Hexane: EtOAc, 5:1-5:2), gave 2,3,6-trimethyl-4-nitrophenol (7.56 g), as a yellow solid. 1H-NMR, (300 MHz, CDCl3) δ=7.61 6, (br s, 1H), 2.432 (s, 3H), 2.275 (s, 3H), 2.242 (s, 3H) ppm.

후처리

  1. customthe mixture was evaporated
  2. washThis solution was washed with water (150 mL×2), and brine (150 mL)
  3. customdried
  4. customevaporated
  5. washElution on a silica column (Hexane: EtOAc, 5:1-5:2)

출처 및 근거

ORD 기록
ord-9c00488efff84b0894fb74369e5bd5bb
출처 데이터셋
uspto-grants-2009_08
특허 번호
US07576094B2

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