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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 2112264생성일: 2026년 10월 26일

Chlorotrimethylsilane → Ondansetron

https://huagongshe.com/reaction/2112264

반응식

참여 물질

역할이름HCID투입량
반응물ChlorotrimethylsilaneHCID 6397—
반응물2-MethylimidazoleHCID 12749—
반응물DipiperidinomethaneHCID 70151—
반응물9-Methyl-1,2,3,9-tetrahydro-4H-carbazol-4-oneHCID 598875—
용매WaterHCID 962—
용매DimethylformamideHCID 6228—
생성물OndansetronHCID 459568%

반응 조건

온도90 °C

반응 단계

2.0 g of 1,2,3,9-tetrahydro-9-methyl-4H-carbazol-4-one, 1.65 g of 2-methyl imidazole and 2.74 g of dipiperidinomethane were suspended in 20 ml of N,N-dimethylformamide, and then 4 ml of chlorotrimethylsilane was slowly added thereto. The reaction mixture was stirred for 8 hours at 90° C. 100 ml of water was added to the reaction mixture. The resulting solid was filtered and dried, which was then suspended in acetone and stirred for 3 hours, and then filtered and dried under a reduced pressure to give 1.99 g of title compound (yield 68%).

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US07521565B2
출처 데이터셋uspto-grants-2009_04
ORD IDord-1d349961fb0e473ea1aeea743bc6ffe0
출처 메모uspto-grants-2009_04