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2-cyclopropylquinoline-4-carboxylic acid → HCID 69203211, 화합물

HRID 2114139
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HRID 2114139 반응식
[NH2:1][C:2]1[CH:3]=[CH:4][C:5]([CH3:21])=[C:6]([C:8]2[CH:13]=[CH:12][C:11]([C:14]([NH:16][CH2:17][CH:18]3[CH2:20][CH2:19]3)=[O:15])=[CH:10][CH:9]=2)[CH:7]=1.[CH:22]1([C:25]2[CH:34]=[C:33]([C:35](O)=[O:36])[C:32]3[C:27](=[CH:28][CH:29]=[CH:30][CH:31]=3)[N:26]=2)[CH2:24][CH2:23]1>C1COCC1>[CH:22]1([C:25]2[CH:34]=[C:33]([C:35]([NH:1][C:2]3[CH:7]=[C:6]([C:8]4[CH:13]=[CH:12][C:11]([C:14]([NH:16][CH2:17][CH:18]5[CH2:20][CH2:19]5)=[O:15])=[CH:10][CH:9]=4)[C:5]([CH3:21])=[CH:4][CH:3]=3)=[O:36])[C:32]3[C:27](=[CH:28][CH:29]=[CH:30][CH:31]=3)[N:26]=2)[CH2:24][CH2:23]1
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참가 물질

4

반응물 2

HCID 2757852-cyclopropylquinoline-4-carboxylic acidHCID 113004885'-amino-N-(cyclopropylmethyl)-2'-methyl-1,1'-biphenyl-4-carboxamide

생성물 1

HCID 69203211HCID 69203211, 화합물

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매

실험 절차

5′-Amino-N-(cyclopropylmethyl)-2′-methyl-1,1′-biphenyl-4-carboxamide (42 mg, 0.15 mmol) and 2-cyclopropylquinoline-4-carboxylic acid (85.3 mg, 0.4 mmol) were mixed in THF (5 ml) and the mixture shaken in a varian tube for 30 min at room temperature. Carbodiimde resin (442 mg, 0.5 mmol) was added and shaking continued for 18 h. The solution was filtered off, the resin washed with THF and methanol and the combined filtrate and washings reduced to dryness under vacuum. The residue was dissolved in ethyl acetate, washed with hydrochloric acid (1M) and aqueous sodium hydrogen carbonate. The solvent was evaporated from the organic fraction under vacuum to give 2-cyclopropyl-N-(4′-{[(cyclopropylmethyl)amino]carbonyl}-6-methyl-1,1′-biphenyl-3-yl)quinoline-4-carboxamide. NMR; δH [2H6]—DMSO 10.74,(1H, s), 8.62,(1H, t), 8.04,(1H, d), 7.94-7.90,(3H, m), 7.74-7.70,(3H, m), 7.62,(1H, s), 7.53,(1H, m), 7.45,(2H, d), 7.33,(1H, d), 3.16,(2H, t), 2.37,(1H, m), 2.22,(3H, s), 1.15-1.10,(5H, m), 0.43,(2H, m), 0.24,(2H, m). LCMS: retention time 3.61 min, MH+476.

후처리

  1. stirringshaking
  2. waitcontinued for 18 h
  3. filtrationThe solution was filtered off
  4. washthe resin washed with THF and methanol
  5. dissolutionThe residue was dissolved in ethyl acetate
  6. washwashed with hydrochloric acid (1M) and aqueous sodium hydrogen carbonate
  7. customThe solvent was evaporated from the organic fraction under vacuum

출처 및 근거

ORD 기록
ord-acb732e531f64193a31cce529605ccf9
출처 데이터셋
uspto-grants-2008_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07432289B2

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