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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 216283생성일: 2026년 10월 25일

Dimethyl Sulfoxide → HCID 86598720, 화합물

https://huagongshe.com/reaction/216283

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참여 물질

역할이름HCID투입량
반응물Dimethyl SulfoxideHCID 679—
반응물TriethylamineHCID 8471—
반응물Oxalyl chlorideHCID 65578—
반응물Valine methyl esterHCID 94285—
반응물Sodium cyanoborohydrideHCID 5003444—
반응물Sodium Acetate TrihydrateHCID 23665404—
반응물Tert-butyl 2-hydroxyethyl[(2-methyl-1,3-thiazol-4-yl)methyl]carbamateHCID 66890987—
용매DichloromethaneHCID 6344—
용매Methanol--water (1/1)HCID 22242641—
생성물HCID 86598720HCID 86598720—

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온도0 °C

반응 단계

A solution of the product of Example 143B (2.26 g) in dichloromethane (20 mL) was treated with oxalyl chloride (5.4 mL, 1.5 equivalents) at −78° C., and stirred for 15 min. DMSO (1.02 mL, 2 equivalents) was added dropwise at −78° C., stirred for 15 min, and quenched with triethylamine (4 mL, 4 equivalents) as the mixture warmed to 0° C. The mixture was quenched with 20% KH2PO4, and partitioned between dichloromethane and water. The organic layer was washed with brine, dried over Na2SO4, filtered, and the solvents were evaporated. To this crude product was added methanol/water (7:2), (L)-valine methyl ester (1.21 g, 1 equivalent), sodium acetate trihydrate (1.96 g, 2 equivalents), and NaCNBH3 (0.95 g, 2 equivalents) was added portionwise over 30 min. After stirring for 1 hour the mixture was partitioned between saturated NaHCO3 and extracted with ethyl acetate (2×). The combined organic layer was washed with brine, dried with Na2SO4, and evaporated. The residue was treated with dichloromethane/trifluoacetic acid (10 mL, 1:1) and stirred at 25° C. for 2 hrs and concentrated.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US08193227B2
출처 데이터셋uspto-grants-2012_06
ORD IDord-10f52b905ffc4db29f0ea5e79206f1e9
출처 메모uspto-grants-2012_06