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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 217548생성일: 2026년 10월 23일

Mesitylene → Anthracene

https://huagongshe.com/ko/reaction/217548

반응식

참여 물질

역할이름HCID투입량
반응물MesityleneHCID 7947—
반응물AnthracenecarboxaldehydeHCID 35864—
반응물1-VinylanthraceneHCID 13907058—
생성물AnthraceneHCID 8418—

반응 조건

온도150 °C

반응 단계

Approximately 10 mmol mesitylene solution of vinylanthracene (VA) or anthraldehyde (AnA) was put in a round bottom flask and bubbled with nitrogen or argon gas for at least 30 min. A piece of the H-terminated silicon substrate was then immersed in the solution and allowed to react with VA or AnA for about 12 h under reflux at about 150° C. in an oil bath. During the reaction, the solution was also purged with nitrogen (or argon) to eliminate dissolved oxygen and to prevent the substrate from being oxidized. After the reaction, the substrate derivatized with VA or AnA was rinsed with dichloromethane, acetonitrile and methanol, and dried under a stream of nitrogen gas. The derivatization of the H-terminated surface with anthracene moieties as described in Example 3 is illustrated in FIG. 6.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US08197650B2
출처 데이터셋uspto-grants-2012_06
ORD IDord-f58781bb35a2402ab83b7ad0e71ac9f1
출처 메모uspto-grants-2012_06