HCID 136381452, 화합물 → HCID 136381453, 화합물

HRID 2191027노트

반응식

HRID 2191027 반응식
[CH2:1]([O:3][P:4]([CH:9]=[CH:10][CH:11]1[CH:18]2[CH:14]([O:15]C(C)(C)[O:17]2)[CH:13]([N:21]2[CH:29]=[N:28][C:27]3[C:26](=[O:30])[NH:25][C:24]([NH:31][C:32](=[O:36])[CH:33]([CH3:35])[CH3:34])=[N:23][C:22]2=3)[O:12]1)(=[O:8])[O:5][CH2:6][CH3:7])[CH3:2]>C(O)(C(F)(F)F)=O.O>[CH2:1]([O:3][P:4]([CH:9]=[CH:10][CH:11]1[CH:18]([OH:17])[CH:14]([OH:15])[CH:13]([N:21]2[CH:29]=[N:28][C:27]3[C:26](=[O:30])[NH:25][C:24]([NH:31][C:32](=[O:36])[CH:33]([CH3:34])[CH3:35])=[N:23][C:22]2=3)[O:12]1)(=[O:8])[O:5][CH2:6][CH3:7])[CH3:2]

참가 물질

4

반응물 1

HCID 136381452HCID 136381452, 화합물

생성물 1

HCID 136381453HCID 136381453, 화합물수율 86.5%

시약·촉매·용매 2

HCID 962Water용매HCID 6422Trifluoroacetic acid용매

실험 절차

Compound 18.3 (850 mg, 1.62 mmol) was dissolved in 9 mL TFA and 1 mL water mixture, stirred for 1.5 h. The mixture was concentrated under reduced pressure, and the residue was subjected to a silica gel column chromatography eluting with 10% MeOH in CH2Cl2 to give compound 18.4 (680 mg, 86.4% yield).

후처리

  1. concentrationThe mixture was concentrated under reduced pressure
  2. washeluting with 10% MeOH in CH2Cl2

출처 및 근거

ORD 기록
ord-b744bf7aa3e7479d970dbdaa3db7b2ab
출처 데이터셋
uspto-grants-2012_12
특허 번호
US08324179B2

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