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HRID 219377생성일: 2026년 10월 26일

Nitrogen → 6-Bromo-2-((4-fluorophenyl)ethynyl)pyridin-3-yl acetate

https://huagongshe.com/reaction/219377

반응식

참여 물질

역할이름HCID투입량
반응물NitrogenHCID 947—
반응물1-Ethynyl-4-fluorobenzeneHCID 522627—
반응물6-Bromo-2-iodopyridin-3-yl acetateHCID 86639957—
촉매Copper(1+) iodide; Copper(I) iodide; Cuprous iodide; Cuprous iodide (CuI)HCID 24350—
촉매HCID 178418476HCID 178418476—
용매TriethylamineHCID 8471—
생성물6-Bromo-2-((4-fluorophenyl)ethynyl)pyridin-3-yl acetateHCID 8663995873.4%

반응 조건

온도85 °C

반응 단계

6-bromo-2-iodopyridin-3-yl acetate (3.50 g, 10.24 mmol), 1-ethynyl-4-fluorobenzene (1.11 g, 9.21 mmol), copper (I) iodide (117 mg, 0.614 mmol), trans-dichlorobis(triphenylphosphine)palladium (II) (359 mg, 0.512 mmol) were combined and evacuated/backfilled with N2 (3×) then diluted with triethylamine (100 ml) and heated to 85° C. for 2 hours. The solvent was evaporated and the reaction was dissolved in EtOAc. The organic phase was washed with water (50 mL) and brine, dried over Na2SO4, filtered, and concentrated and was purified on silica gel (Biotage, EtOAc/hexanes gradient, fraction collection at λ=254 nm) to give the expected product 6-bromo-2-((4-fluorophenyl)ethynyl)pyridin-3-yl acetate (2.26 g, 6.76 mmol, 66.1% yield) consistent by NMR. 1H NMR (400 MHz, DMSO-d6) δ ppm 7.77 (2H, s), 7.70 (2H, dd, J=8.78, 5.52 Hz), 7.34 (2H, t, J=8.91 Hz), 2.41 (3H, s). LC-MS retention time: 2.18 min; m/z: parent ion not observed, —Ac: 292, 294. LC data was recorded on a Shimadzu LC-10AS liquid chromatograph equipped with a Waters SunFire 5u C18 4.6×50 mm column using a SPD-10AV UV-Vis detector at a detector wave length of 220 nM. The elution conditions employed a flow rate of 5 ml/min, a gradient of 100% solvent A/0% solvent B to 0% solvent A/100% solvent B, a gradient time of 3 min, a hold time of 1 min, and an analysis time of 4 min where solvent A was 10% acetonitrile/90% H2O/0.1% trifluoroacetic acid and solvent B was 10% H2O/90% acetonitrile/0.1% trifluoroacetic acid. MS data was determined using a Micromass Platform for LC in electrospray mode.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US08198449B2
출처 데이터셋uspto-grants-2012_06
ORD IDord-0f66297e56344d9bae4e9a4bf9a1c18e
출처 메모uspto-grants-2012_06