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Sulfuric Acid → 3-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid tert-butyl ester

HRID 2193898
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HRID 2193898 반응식
[C:1]1([CH3:19])[C:2]([S:7]([NH:10][C:11]2[CH:15]=[CH:14][S:13][C:12]=2[C:16]([OH:18])=[O:17])(=[O:9])=[O:8])=[CH:3][CH:4]=[CH:5][CH:6]=1.OS(O)(=O)=O>>[C:1]([O:17][C:16]([C:12]1[S:13][CH:14]=[CH:15][C:11]=1[NH:10][S:7]([C:2]1[C:1]([CH3:19])=[CH:6][CH:5]=[CH:4][CH:3]=1)(=[O:9])=[O:8])=[O:18])([CH3:19])([CH3:2])[CH3:6]
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참가 물질

3

반응물 2

HCID 1118Sulfuric AcidHCID 224961893-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid

생성물 1

HCID 207757763-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid tert-butyl ester수율 146.8%

실험 절차

To a cold (−40° C.) mixture of 3-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid (1.5 g, 5.05 mmol) in 1,4-dioxane/CHCl, (1:2, 12 mL) was bubbled 2-methyl-2-propene gas (15 mL) in a sealed tube. To this was added Conc. H2SO4 (0.070 mL, 1.3 mmol) and slowly warmed up to room temperature. The resultant reaction mixture was heated at 70° C. for 2.5 days in a sealed tube, cooled to −40° C., stopper was removed. The reaction mixture was slowly brought up to room temperature and stirred until the excess gas is released. The mixture was extracted with EtOAc, washed with aq. NaHCO3 solution, brine and dried. Evaporation of the solvent and purification of the residue on silica gel using EtOAc/hexane (1:10) as an eluent furnished 3-(Toluene-2-sulfonylamino)-thiophene-2-carboxylic acid tert-butyl ester (1.31 g, 73.5% based on 90% conversion). 1H NMR (CDCl3, 300 MHz) 9.89 (s, 1H), 8.01 (d, J=7.9 Hz, 1H), 7.43 (dt, J=7.5 Hz, 1.5 Hz, 1H), 7.3-7.25 (m, 3H), 7.2 (d, J=5.4 Hz, 1H), 2.69 (s, 3H), 1.56 (s, 9H).

후처리

  1. customwas bubbled 2-methyl-2-propene gas (15 mL) in a sealed tube
  2. customThe resultant reaction mixture
  3. temperaturewas heated at 70° C. for 2.5 days in a sealed tube
  4. temperaturecooled to −40° C.
  5. customstopper was removed
  6. customwas slowly brought up to room temperature
  7. extractionThe mixture was extracted with EtOAc
  8. washwashed with aq. NaHCO3 solution, brine
  9. customdried
  10. customEvaporation of the solvent and purification of the residue on silica gel

출처 및 근거

ORD 기록
ord-965328ee2039420cb75ef1c503bdaec4
출처 데이터셋
uspto-grants-2012_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08329924B2

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