참여 물질
| 역할 | 이름 | HCID | 투입량 |
|---|
| 반응물 | Hydrogen Peroxide | HCID 784 | — |
| 반응물 | Oxygen | HCID 977 | — |
| 반응물 | Sulfuric Acid | HCID 1118 | — |
| 반응물 | Toluene | HCID 1140 | — |
| 반응물 | Levodopa | HCID 6047 | — |
| 반응물 | Trisodium Phosphate | HCID 24243 | — |
| 반응물 | Aminopropyltrimethoxysilane | HCID 83756 | — |
| 반응물 | Trisilicon tetranitride | HCID 3084099 | — |
| 용매 | Chloroform | HCID 6212 | — |
| 생성물 | N-(tert-Buloxycarbonyl)-3,4-dihydroxy-L-phenylalanine | HCID 14217229 | — |
반응 단계
Before the surface modification of silicon nitride (Si3N4) tips, cleaning procedures were performed using O2 plasma (name of a machine) for 3 min and subsequently they were transferred to a piranha solution (sulfuric acid:H2O2=8:2) for 30 min. They moved to 20% (v/v) 3-aminopropyltrimethoxysilane in toluene to be functionalized with amines for 30 to 60 min after rinsing with H2O. Two polyethylene glycol (PEG) derivatives were chosen for PEGylation on the AFM tips: mPEG-N-hydroxy succinimide (NHS) (Mw 2000) and Fmoc-PEG-NHS (Mw 3400) (Nektar Inc.). Mixture (Fmoc-PEG-NHS:mPEGNHS=1:5-10, 5 mM) of PEGs were prepared in 50 mM sodium phosphate buffer, 0.6 M K2SO4, pH 7.8 and chloroform. PEGylation reactions were conducted sequentially first in a sodium phosphate buffer at 40° C. and subsequently in chloroform for 3 hrs in each step. The reason to use PEG mixture is to prevent multiple DOPA binding on TiO2. Fmoc-PEG-NHS provides an amine for Boc-DOPA conjugation after Fmoc cleavage.Piperidine (20% v/v in NMP) was used to deprotect Fmoc for 5 min and subsequently cantilevers were transferred to BOP/HOBt/DOPA (a molar ratio of 1:1:1, final 8 mM in NMP) solution with 10 μL DIPEA. The same procedure was used for Tyrosine modification.
출처 및 근거
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| 특허 번호 | US07858679B2 |
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| 출처 데이터셋 | uspto-grants-2010_12 |
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| ORD ID | ord-c4c117ee435f42918ba4a51c3dd4c0b1 |
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| 출처 메모 | uspto-grants-2010_12 |
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