Thionyl Chloride → HCID 12018889, 화합물
반응식
[Si:1]([O:8][CH2:9][C:10]1[CH:18]=[CH:17][C:13]([C:14](O)=[O:15])=[CH:12][CH:11]=1)([C:4]([CH3:7])([CH3:6])[CH3:5])([CH3:3])[CH3:2].S(Cl)([Cl:21])=O>>[Si:1]([O:8][CH2:9][C:10]1[CH:18]=[CH:17][C:13]([C:14]([Cl:21])=[O:15])=[CH:12][CH:11]=1)([C:4]([CH3:7])([CH3:6])[CH3:5])([CH3:3])[CH3:2]참가 물질
3
반응 조건
- 온도
- 80 °C
실험 절차
4-[[t-Butyl(dimethyl)silyl]oxymethyl]benzoic acid (1.44 g) was suspended in thionyl chloride and the mixture was heated to 80° C. for 45 minutes. The resulting solution was concentrated in vacuo. Residual thionyl chloride and HCl were removed by subsequent concentration from toluene (twice). The crude residue was carried on to the next reaction step without purification.
후처리
- concentrationThe resulting solution was concentrated in vacuo
- customResidual thionyl chloride and HCl were removed by subsequent concentration from toluene (twice)
- customThe crude residue was carried on to the next reaction step without purification
출처 및 근거
- ORD 기록
- ord-61798e268da144de97cf087135e1e13b
- 출처 데이터셋
- uspto-grants-2015_09
- 특허 번호
- US09139532B2
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