Trifluoroacetic acid → HCID 178521335, 화합물

HRID 2289055노트

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HRID 2289055 반응식
[N+:1]([C:4]1[CH:45]=[CH:44][C:7]([CH2:8][O:9][C:10]([N:12]=[C:13]([NH:30][C:31]([O:33][CH2:34][C:35]2[CH:40]=[CH:39][C:38]([N+:41]([O-:43])=[O:42])=[CH:37][CH:36]=2)=[O:32])[NH:14][CH2:15][C:16]([NH:18][CH:19]2[CH2:22][N:21](C(OC(C)(C)C)=O)[CH2:20]2)=[O:17])=[O:11])=[CH:6][CH:5]=1)([O-:3])=[O:2].[F:46][C:47]([F:52])([F:51])[C:48]([OH:50])=[O:49]>ClCCl>[F:46][C:47]([F:52])([F:51])[C:48]([OH:50])=[O:49].[N+:1]([C:4]1[CH:45]=[CH:44][C:7]([CH2:8][O:9][C:10]([N:12]=[C:13]([NH:30][C:31]([O:33][CH2:34][C:35]2[CH:36]=[CH:37][C:38]([N+:41]([O-:43])=[O:42])=[CH:39][CH:40]=2)=[O:32])[NH:14][CH2:15][C:16]([NH:18][CH:19]2[CH2:22][NH:21][CH2:20]2)=[O:17])=[O:11])=[CH:6][CH:5]=1)([O-:3])=[O:2]

참가 물질

4

반응물 2

HCID 6422Trifluoroacetic acidHCID 178452375HCID 178452375, 화합물

생성물 1

HCID 178521335HCID 178521335, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a solution of the compound (1.92 g), which had been obtained in (1), in anhydrous dichloromethane (10 ml), trifluoroacetic acid (5 ml) was added under ice cooling. The resulting mixture was stirred for one hour, followed by concentration under reduced pressure. The residue was washed with hexane-ether, followed by evaporation of the solvent, whereby 2.78 g of the title target compound were obtained. The product was provided for the subsequent step without purification.

후처리

  1. concentrationfollowed by concentration under reduced pressure
  2. washThe residue was washed with hexane-ether
  3. customfollowed by evaporation of the solvent, whereby 2.78 g of the title target compound
  4. customwere obtained
  5. customThe product was provided for the subsequent step without purification

출처 및 근거

ORD 기록
ord-1871abd1f5174d199e0d21ec25e1ecb9
출처 데이터셋
uspto-grants-2000_07
특허 번호
US06090802

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