홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Hexane → cis-1-(tert-butyldimethylsilyl)-3-[(R)-1-hydroxyethyl]-4-trimethylsilylethynyl-2-azetidinone

HRID 231236
노트
인쇄 미리보기

반응식

HRID 231236 반응식
[OH:1][C@@H:2]([C@H:4]1[C@@H:7]([C:8]#[C:9][Si:10]([CH3:13])([CH3:12])[CH3:11])[NH:6][C:5]1=[O:14])[CH3:3].C([Li])CCC.CCCCCC.[Si:26](Cl)([C:29]([CH3:32])([CH3:31])[CH3:30])([CH3:28])[CH3:27]>O1CCCC1.O.C(OCC)(=O)C>[Si:26]([N:6]1[C@H:7]([C:8]#[C:9][Si:10]([CH3:12])([CH3:11])[CH3:13])[C@H:4]([C@H:2]([OH:1])[CH3:3])[C:5]1=[O:14])([C:29]([CH3:32])([CH3:31])[CH3:30])([CH3:28])[CH3:27]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

8

반응물 4

HCID 8058HexaneHCID 28928tert-Butyldimethylsilyl chlorideHCID 18633014cis-3-[(R)-1-hydroxyethyl]-4-trimethylsilylethynyl-2-azetidinoneHCID 178418339Butyllithium

생성물 1

HCID 67788869cis-1-(tert-butyldimethylsilyl)-3-[(R)-1-hydroxyethyl]-4-trimethylsilylethynyl-2-azetidinone수율 32.5%

시약·촉매·용매 3

HCID 962
Water
용매
HCID 8028Tetrahydrofuran용매2회
HCID 8857Ethyl Acetate용매

반응 조건

온도
-70 °C

실험 절차

Cis-3-[(R)-1-hydroxyethyl]-4-trimethylsilylethynyl-2-azetidinone (0.8 g) is dissolved in dry tetrahydrofuran (15 ml) in an argon stream, and the solution is cooled to -70° C. followed by dropwise addition of n-butyllithium (1.6M)-hexane (4.8 ml) while carefully maintaining the temperature so as not to exceed -65° C. To the mixture is added dropwise a solution of tert-butyldimethylsilyl chloride (0.86 g) in dry tetrahydrofuran (5 ml) at -70° C. or lower, and the resulting mixture is stirred at the same temperature for an hour and then poured into a mixture of ethyl acetate (100 ml) and water (100 ml). The organic layer is separated, washed with aqueous sodium chloride and dried over magnesium sulfate. The solvent is then distilled off under reduced pressure and the residue is subjected to silica gel column chromatography (eluent: 1:9 ethyl acetate-n-hexane mixture) to give 0.40 g of cis-1-(tert-butyldimethylsilyl)-3-[(R)-1-hydroxyethyl]-4-trimethylsilylethynyl-2-azetidinone.

후처리

  1. temperaturewhile carefully maintaining the temperature so as not
  2. customto exceed -65° C
  3. customThe organic layer is separated
  4. washwashed with aqueous sodium chloride
  5. dry with materialdried over magnesium sulfate
  6. distillationThe solvent is then distilled off under reduced pressure

출처 및 근거

ORD 기록
ord-b8c4ee0e9d8549ea851db02b502640f9
출처 데이터셋
uspto-grants-1989_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US04845210

반응 노트

불러오는 중…

이 페이지에서참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트