반응식
[CH2:1]=[CH:2][CH:3]=[CH2:4].[C:5](#N)[CH:6]=[CH2:7].[C:9](O)(=O)[CH:10]=[CH2:11]>>[CH3:7][C:6]1[CH2:5][CH2:4][C@@H:3]([C:10]([CH3:11])=[CH2:9])[CH2:2][CH:1]=1참가 물질
4
실험 절차
Photopolymer plates based on a terpolymer of butadiene, acrylonitrile and acrylic acid were processed as in Example 1 with this solvent. Wash time for this type plate in this wash solution was 16 minutes. Plate exposure times equivalent to those required for perchloroethylene-n-butanol washed plates were necessary to hold 0.004" lines and 3%, 150 line half tones with this wash solvent.
후처리
- washWash time for this type plate in this wash solution
출처 및 근거
- ORD 기록
- ord-0cb505034cd642af87643d4fbefca764
- 출처 데이터셋
- uspto-grants-1989_07
- 특허 번호
- US04847182
연결된 노트
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