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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 2379300생성일: 2026년 10월 26일

Dichlorodimethylsilane → di(1H-inden-1-yl)dimethylsilane

https://huagongshe.com/reaction/2379300

반응식

참여 물질

역할이름HCID투입량
반응물DichlorodimethylsilaneHCID 6398—
반응물IndeneHCID 7219—
반응물ButyllithiumHCID 178418339—
반응물HCID 178506815HCID 178506815—
생성물di(1H-inden-1-yl)dimethylsilaneHCID 59942971%

반응 단계

In detail, in Japanese Patent Laid-Open Publication No. 221285/1990 for example, a solution of an indenyl lithium salt prepared from indene and n-butyllithium is slowly added to a dimethyldichlorosilane solution, and they are reacted with each other overnight to obtain dimethyldi(1-indenyl)silane in a 71% yield. In Japanese Patent Laid-Open Publication No. 268307/1992, dimethyldi (2-methyl-1-indenyl) silane is obtained in a 16% yield in a manner similar to the above.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US05360921
출처 데이터셋uspto-grants-1994_11
ORD IDord-ce9b78dae72b4ddc992262c705339d43
출처 메모uspto-grants-1994_11