Trifluoroacetic acid → HCID 57916235, 화합물

HRID 2388662노트

반응식

HRID 2388662 반응식
[Cl:1][C:2]1[CH:7]=[CH:6][CH:5]=[C:4]([CH3:8])[C:3]=1[S:9]([N:12]([CH2:16][CH2:17][O:18][CH2:19][C:20]([O:22]C(C)(C)C)=[O:21])[CH:13]1[CH2:15][CH2:14]1)(=[O:11])=[O:10].FC(F)(F)C(O)=O>ClCCl>[Cl:1][C:2]1[CH:7]=[CH:6][CH:5]=[C:4]([CH3:8])[C:3]=1[S:9]([N:12]([CH2:16][CH2:17][O:18][CH2:19][C:20]([OH:22])=[O:21])[CH:13]1[CH2:14][CH2:15]1)(=[O:10])=[O:11]

참가 물질

4

반응물 2

HCID 6422Trifluoroacetic acidHCID 57916276tert-butyl 2-(2-(2-chloro-N-cyclopropyl-6-methylphenylsulfonamido)ethoxy)acetate

생성물 1

HCID 57916235HCID 57916235, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a dichloromethane (10 ml/mmol) solution of tert-butyl 2-(2-(2-chloro-N-cyclopropyl-6-methylphenylsulfonamido)ethoxy)acetate (1 eq.) was added trifluoroacetic acid (13 eq.) at 0° C. and the resulting reaction mixture was stirred at ambient temperature for 2 h. The solvent was evaporated off and the residue dried under vacuum to remove traces of trifluoroacetic acid. The crude product was used in the next step without further purification. Yield: quantitative

후처리

  1. customthe resulting reaction mixture
  2. customThe solvent was evaporated off
  3. customthe residue dried under vacuum
  4. customto remove traces of trifluoroacetic acid
  5. customThe crude product was used in the next step without further purification

출처 및 근거

ORD 기록
ord-b0de5525e311437eb2cd016bd7b2640e
출처 데이터셋
uspto-grants-2012_09
특허 번호
US08268814B2

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