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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 249230생성일: 2026년 10월 26일

Nitric Acid → 2-Nitro-4-nonylphenol

https://huagongshe.com/reaction/249230

반응식

참여 물질

역할이름HCID투입량
반응물Nitric AcidHCID 944—
반응물4-NonylphenolHCID 1752—
용매Acetic AcidHCID 176—
생성물2-Nitro-4-nonylphenolHCID 1818354878%

반응 단계

10 g of 4-nonylphenol (manufactured by Tokyo Kasei K.K., containing 10% of ortho compound) was dissolved in 30 ml of acetic acid and to the resulting solution was added 20 ml of 30% solution of nitric acid at 5°-10° C. for 2 hours. After 10 minutes, the resulting solution was treated with 50 g of ice water and then extracted with three 50-ml portions of ether. The ether was distilled off and then the residue was isolated using a silica gel column to obtain 9.33 g of the desired product in a 78% yield.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US05213888
출처 데이터셋uspto-grants-1993_05
ORD IDord-06b804ffcfc54dfab60084ee8966f56c
출처 메모uspto-grants-1993_05