Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
Nitric Acid → 2-Nitro-4-nonylphenol
참여 물질
| 역할 | 이름 | HCID | 투입량 |
|---|---|---|---|
| 반응물 | Nitric Acid | HCID 944 | — |
| 반응물 | 4-Nonylphenol | HCID 1752 | — |
| 용매 | Acetic Acid | HCID 176 | — |
| 생성물 | 2-Nitro-4-nonylphenol | HCID 18183548 | 78% |
반응 단계
10 g of 4-nonylphenol (manufactured by Tokyo Kasei K.K., containing 10% of ortho compound) was dissolved in 30 ml of acetic acid and to the resulting solution was added 20 ml of 30% solution of nitric acid at 5°-10° C. for 2 hours. After 10 minutes, the resulting solution was treated with 50 g of ice water and then extracted with three 50-ml portions of ether. The ether was distilled off and then the residue was isolated using a silica gel column to obtain 9.33 g of the desired product in a 78% yield.
출처 및 근거
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| 특허 번호 | US05213888 |
| 출처 데이터셋 | uspto-grants-1993_05 |
| ORD ID | ord-06b804ffcfc54dfab60084ee8966f56c |
| 출처 메모 | uspto-grants-1993_05 |