Trimethylaluminum → Tri-n-decylmethylmethane

HRID 2585

반응식

HRID 2585 반응식
[CH2:1]([C:11](Cl)([CH2:22][CH2:23][CH2:24][CH2:25][CH2:26][CH2:27][CH2:28][CH2:29][CH2:30][CH3:31])[CH2:12][CH2:13][CH2:14][CH2:15][CH2:16][CH2:17][CH2:18][CH2:19][CH2:20][CH3:21])[CH2:2][CH2:3][CH2:4][CH2:5][CH2:6][CH2:7][CH2:8][CH2:9][CH3:10].[CH3:33][Al](C)C>C(Cl)Cl>[CH2:1]([C:11]([CH2:22][CH2:23][CH2:24][CH2:25][CH2:26][CH2:27][CH2:28][CH2:29][CH2:30][CH3:31])([CH2:12][CH2:13][CH2:14][CH2:15][CH2:16][CH2:17][CH2:18][CH2:19][CH2:20][CH3:21])[CH3:33])[CH2:2][CH2:3][CH2:4][CH2:5][CH2:6][CH2:7][CH2:8][CH2:9][CH3:10]

참가 물질

4

반응물 2

HCID 16682925TrimethylaluminumHCID 19690416Tri-n-decylmethylchloride

생성물 1

HCID 19690393Tri-n-decylmethylmethane수율 75%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

반응 조건

온도
0 °C

실험 절차

One mole of tri-n-decylmethylchloride was added to 0.75 liters of methylene chloride and the solution was blanketed with nitrogen and cooled to 0° C. 0.33 moles of trimethylaluminum was then added and the mixture was allowed to warm to room temperature. The mixture was slowly quenched with 50 ml of water followed by washing with 1 liter of a 10% HCl solution. The organic layer was dried with magnesium sulfate and the solvent was evaporated to give tri-n-decylmethylmethane after vacuum distillation at 225 C/0.5 torr. The yield was 75%.

후처리

  1. temperatureto warm to room temperature
  2. customThe mixture was slowly quenched with 50 ml of water
  3. washby washing with 1 liter of a 10% HCl solution
  4. dry with materialThe organic layer was dried with magnesium sulfate
  5. customthe solvent was evaporated

출처 및 근거

ORD 기록
ord-d5601d68778243e1afd472a048d0d106
출처 데이터셋
uspto-grants-1998_03
특허 번호
US05728907

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