돌아가기
Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 2601생성일: 2026년 10월 23일

Chlorotrimethylsilane → 8-Trimethylsilyl-2,2,6,6-tetramethylbenzo[1,2-d:5,4-d']-bis(1,3)oxathiole

https://huagongshe.com/ko/reaction/2601

반응식

참여 물질

역할이름HCID투입량
반응물ChlorotrimethylsilaneHCID 6397—
반응물2,2,6,6-Tetramethylbenzo[1,2-d:5,4-d']bis(1,3)oxathioleHCID 18785228—
반응물ButyllithiumHCID 178418339—
용매TetrahydrofuranHCID 8028—
생성물8-Trimethylsilyl-2,2,6,6-tetramethylbenzo[1,2-d:5,4-d']-bis(1,3)oxathioleHCID 18785237—

반응 단계

The reaction was performed under an argon atmosphere using deoxygenated solvents. 2,2,6,6-tetramethylbenzo[1,2-d:5,4-d']-bis(1,3)oxathiole (6.0 g, 23.6 mmol) was dissolved in dry THF (120 mL). The mixture was cooled on an ice-bath and n-butyllithium (10.8 mL, 2.5M in hexane) was added dropwise over 10 min. After 15 min, chlorotrimethylsilane (6.0 mL, 47.2 mmol) was added dropwise over 5 min. After another 15 min, the reaction mixture was quenched with dietyl ether/aq. NaHCO3, the aqueous layer was extracted with ether and the combined organic layers were washed with water and dried (Na2SO4). After evaporation and chromatography (silica gel, chloroform) essentially pure product (6.3 g, 92%) could be collected.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US05728370
출처 데이터셋uspto-grants-1998_03
ORD IDord-3fd18c20fe384f209c75449594a77dfc
출처 메모uspto-grants-1998_03