Tetrahydrofuran → tert-butyl N-[4-(isopropylformylamino)cyclohexyl]methylcarbamate

HRID 323705노트

반응식

HRID 323705 반응식
C(NC1CCC([CH2:11][NH:12][C:13](=[O:19])[O:14][C:15]([CH3:18])([CH3:17])[CH3:16])CC1)(C)C.[N:20]1([CH:29]=[O:30])[C:24]2[CH:25]=[CH:26][CH:27]=[CH:28][C:23]=2N=N1.[CH2:31]1[CH2:35]OC[CH2:32]1>>[CH:31]([C:29]([NH:20][CH:24]1[CH2:25][CH2:26][CH:27]([CH2:11][NH:12][C:13](=[O:19])[O:14][C:15]([CH3:16])([CH3:17])[CH3:18])[CH2:28][CH2:23]1)=[O:30])([CH3:35])[CH3:32]

참가 물질

4

반응물 3

HCID 8028Tetrahydrofuran2회HCID 5767401H-Benzotriazole-1-carboxaldehyde2회HCID 22253999tert-butyl N-[4-(isopropylamino)cyclohexyl]methylcarbamate

생성물 1

HCID 22253966tert-butyl N-[4-(isopropylformylamino)cyclohexyl]methylcarbamate수율 100%

실험 절차

A solution of a tert-butyl N-[4(isopropylamino)cyclohexyl]methylcarbamate (7.89 mmol, 1 equivalent) in 5 ml of THF was added dropwise to a solution of 1H-benzotriazole-1-carboxaldehyde (8.68 mmol, 1.2 equivalent) in 10 ml of THF at room temperature. The reaction mixture was stirred overnight and then heated at reflux temperature for two hours. 1H-benzotriazole-1-carboxaldehyde (additional 1 equivalent) was added to the reaction mixture and stirred overnight. The solvent was removed in vacuo and dichloromethane was added to the residue. The organic phase was washed with 2N NaOH solution, saturated NaCi solution, dried over Na2SO4, and the solvent removed in vacuo. The residue was then chromatographed to give tert-butyl N-[4(isopropylformylamino)cyclohexyl]methylcarbamate: 100% yield, 299 (ESMS, MH+); 1H NMR (CD3OD) δ 8.22 & 8.18 (two s, 1H), 4.63 (broad, 1H), 4.30 & 3.60 (two m, 1H), 3.76 (m, 1H), 2.99 (m, 2H), 1.44 (s, 9H) 1.27 (d, 3H, J=6.5 Hz), 1.21 (d, 3H, J=6.5 Hz), 1.91-0.82 (m, 9H).

후처리

  1. temperatureheated
  2. temperatureat reflux temperature for two hours
  3. stirringstirred overnight
  4. customThe solvent was removed in vacuo and dichloromethane
  5. additionwas added to the residue
  6. washThe organic phase was washed with 2N NaOH solution, saturated NaCi solution
  7. dry with materialdried over Na2SO4
  8. customthe solvent removed in vacuo
  9. customThe residue was then chromatographed

출처 및 근거

ORD 기록
ord-5867ad3b3a82417a9bd95263039cbb2b
출처 데이터셋
uspto-grants-2001_04
특허 번호
US06214853B1

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