Water → Hexamethyldisiloxane

HRID 323775

반응식

HRID 323775 반응식
C([Si:5]([CH3:8])([CH3:7])[CH3:6])(F)(F)F.CCCC[N+](CCCC)(CCCC)CCCC.[F-].[OH2:27]>C1COCC1.C([O-])(O)=O.[Na+]>[Si:5]([O:27][Si:5]([CH3:8])([CH3:7])[CH3:6])([CH3:8])([CH3:7])[CH3:6]

참가 물질

6

반응물 3

HCID 962WaterHCID 552549(Trifluoromethyl)trimethylsilaneHCID 2724141Tetrabutylammonium Fluoride

생성물 1

HCID 24764Hexamethyldisiloxane

시약·촉매·용매 2

HCID 8028Tetrahydrofuran용매3회HCID 516892Sodium Bicarbonate용매

반응 조건

온도
0 °C

실험 절차

This material was dissolved in THF (0.1 mL), cooled to at 0° C. and treated with 0.5 M CF3TMS in THF (30 μL, 15 mmol) followed by 0.05 M TBAF in THF (5 mL, 0.025 mmol). After stirring for 30 min, the reaction mixture was diluted with saturated aqueous NaHCO3 (2 mL) and H2O (1 mL), extracted with EtOAc (6×), dried over Na2SO4, filtered and concentrated to give the crude bis-TMS ether.

후처리

  1. extractionextracted with EtOAc (6×)
  2. dry with materialdried over Na2SO4
  3. filtrationfiltered
  4. concentrationconcentrated

출처 및 근거

ORD 기록
ord-bb8af9c936b34f9785f43c390c91e310
출처 데이터셋
uspto-grants-2001_04
특허 번호
US06214865B1

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