참여 물질
| 역할 | 이름 | HCID | 투입량 |
|---|
| 반응물 | Water | HCID 962 | — |
| 반응물 | Azobisisobutyronitrile | HCID 6547 | — |
| 반응물 | tert-Butyl methacrylate | HCID 11448 | — |
| 반응물 | Methacryloxymethyltrimethylsilane | HCID 2760855 | — |
| 용매 | Methanol | HCID 887 | — |
| 용매 | Toluene | HCID 1140 | — |
| 생성물 | Trimethylsilylmethyl methacrylate tertiarybutyl methacrylate | HCID 86753511 | 80% |
반응 단계
Trimethylsilylmethyl methacrylate (TMSMMA) and tertiarybutyl methacrylate (TBMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 15 minutes. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tertiarybutyl methacrylate copolymer represented by the following formula, ##STR12## wherein each of m and n is a positive integer. In this example, the copolymer described above could be obtained at a yield of 80%, the molecular weight was 38,000 and the dispersion was 1.70.
출처 및 근거
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| 특허 번호 | US05856071 |
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| 출처 데이터셋 | uspto-grants-1999_01 |
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| ORD ID | ord-77ca23db37004b9aa1a47099824914fa |
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| 출처 메모 | uspto-grants-1999_01 |
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