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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 341723생성일: 2026년 10월 26일

Water → Trimethylsilylmethyl methacrylate tertiarybutyl methacrylate

https://huagongshe.com/reaction/341723

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참여 물질

역할이름HCID투입량
반응물WaterHCID 962—
반응물AzobisisobutyronitrileHCID 6547—
반응물tert-Butyl methacrylateHCID 11448—
반응물MethacryloxymethyltrimethylsilaneHCID 2760855—
용매MethanolHCID 887—
용매TolueneHCID 1140—
생성물Trimethylsilylmethyl methacrylate tertiarybutyl methacrylateHCID 8675351180%

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Trimethylsilylmethyl methacrylate (TMSMMA) and tertiarybutyl methacrylate (TBMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 15 minutes. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tertiarybutyl methacrylate copolymer represented by the following formula, ##STR12## wherein each of m and n is a positive integer. In this example, the copolymer described above could be obtained at a yield of 80%, the molecular weight was 38,000 and the dispersion was 1.70.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US05856071
출처 데이터셋uspto-grants-1999_01
ORD IDord-77ca23db37004b9aa1a47099824914fa
출처 메모uspto-grants-1999_01