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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 341724생성일: 2026년 10월 27일

Water → Trimethylsilylmethyl methacrylate tetrahydropyranyl methacrylate

https://huagongshe.com/reaction/341724

반응식

참여 물질

역할이름HCID투입량
반응물WaterHCID 962—
반응물AzobisisobutyronitrileHCID 6547—
반응물MethacryloxymethyltrimethylsilaneHCID 2760855—
반응물Tetrahydropyranyl methacrylateHCID 11041138—
용매MethanolHCID 887—
용매TolueneHCID 1140—
생성물Trimethylsilylmethyl methacrylate tetrahydropyranyl methacrylateHCID 8675351290%

반응 단계

Trimethylsilylmethyl methacrylate (TMSMMA) and tetrahydropyranyl methacrylate (THPMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 7 hours with stirring. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tetrahydropyranyl methacrylate copolymer represented by the following formula, ##STR13## wherein each of m and n is a positive integer.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US05856071
출처 데이터셋uspto-grants-1999_01
ORD IDord-93bf5aa2af9940449353ee994ac951e2
출처 메모uspto-grants-1999_01