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2-Chlorophenylboronic acid → 5-(2-Chlorophenyl)-4-cyano-3-nitroanisole

HRID 353042
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HRID 353042 반응식
Br[C:2]1[C:3]([C:13]#[N:14])=[C:4]([N+:10]([O-:12])=[O:11])[CH:5]=[C:6]([O:8][CH3:9])[CH:7]=1.[Cl:15][C:16]1[CH:21]=[CH:20][CH:19]=[CH:18][C:17]=1B(O)O>C1(C)C=CC=CC=1.CCO.C(=O)([O-])[O-].[Na+].[Na+].C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[Cl:15][C:16]1[CH:21]=[CH:20][CH:19]=[CH:18][C:17]=1[C:2]1[C:3]([C:13]#[N:14])=[C:4]([N+:10]([O-:12])=[O:11])[CH:5]=[C:6]([O:8][CH3:9])[CH:7]=1
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참가 물질

7

반응물 2

HCID 27343222-Chlorophenylboronic acidHCID 227070275-Bromo-4-cyano-3-nitroanisole

생성물 1

HCID 227070565-(2-Chlorophenyl)-4-cyano-3-nitroanisole수율 100%

시약·촉매·용매 4

HCID 178418397HCID 178418397, 화합물촉매HCID 702Ethanol용매
HCID 1140
Toluene
용매
HCID 10340Sodium Carbonate용매

실험 절차

5-Bromo-4-cyano-3-nitroanisole [prepared by the method of Harrison et al, J. Chem. Soc. C, 1769 (1966)] (250 mg, 0.86 mmol) and 2-chlorophenylboronic acid (150 mg, 0.96 mmol) were dissolved in a mixture of toluene (10 ml), EtOH (5.6 ml), and 1N aqueous sodium carbonate (1.7 ml). The solution was placed under a nitrogen atmosphere and tetrakis(triphenylphosphine)palladium (30 mg, 0.03 mmol) added. After refluxing for 3 h, the solvent was removed from the reaction mixture under reduced pressure. The residue was partitioned between H2O (50 ml) and EtOAc (50 ml) and the EtOAc layer washed with H2O (2×50 ml), and dried over MgSO4. Following removal of the solvent, the crude material was purified on silica gel, eluting with hexane/ether (1/1, v/v). This gave the subtitle compound as a colourless gum (252 mg, 100%). Rf 0.38 (hexane/ether 1:1, v/v). MS m/z 306 and 308 (MNH4+).

후처리

  1. temperatureAfter refluxing for 3 h
  2. customthe solvent was removed from the reaction mixture under reduced pressure
  3. customThe residue was partitioned between H2O (50 ml) and EtOAc (50 ml)
  4. washthe EtOAc layer washed with H2O (2×50 ml)
  5. dry with materialdried over MgSO4
  6. customremoval of the solvent
  7. customthe crude material was purified on silica gel
  8. washeluting with hexane/ether (1/1

출처 및 근거

ORD 기록
ord-3f317aa58e3b4b10a40dc6de244f7d94
출처 데이터셋
uspto-grants-2004_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06750214B2

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