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Water → 3-[Hydroxy(3-methoxyphenyl)methyl)-2-oxotetrahydrofuran

HRID 380086
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HRID 380086 반응식
C([N-]C(C)C)(C)C.[Li+].[CH:9](=[O:18])[C:10]1[CH:15]=[CH:14][CH:13]=[C:12]([O:16][CH3:17])[CH:11]=1.[C:19]([O:22][CH2:23][CH3:24])(=[O:21])[CH3:20].O>O1CCCC1>[OH:18][CH:9]([C:10]1[CH:15]=[CH:14][CH:13]=[C:12]([O:16][CH3:17])[CH:11]=1)[CH:20]1[CH2:24][CH2:23][O:22][C:19]1=[O:21]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 962WaterHCID 8857Ethyl AcetateHCID 115693-MethoxybenzaldehydeHCID 2724682Lithium diisopropylamide

생성물 1

HCID 183672943-[Hydroxy(3-methoxyphenyl)methyl)-2-oxotetrahydrofuran

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매2회

실험 절차

To a solution of y-butyrolactone (3.0 g) in tetrahydrofuran (THF) (30 ml) was added lithium diisopropylamide (LDA) (28 ml, 1.5 M solution in cyclohexane) at −78° C. under N2, and then after 30 minutes, a solution of m-anisaldehyde (4.7 g) in THF (10 ml) was added in the solution. After being stirred for 2 hours at the same temperature, the solution was poured into the mixture of ethyl acetate and water. The organic layer was washed with 1N-HCl solution, sat. NaHCO3 and brine, dried over MgSO4, and evaporated in vacuo. The residue was purified by chromatography on silica gel to afford 3-[hydroxy(3-methoxyphenyl)methyl)-2-oxotetrahydrofuran (7.4 g).

후처리

  1. washThe organic layer was washed with 1N-HCl solution, sat. NaHCO3 and brine
  2. dry with materialdried over MgSO4
  3. customevaporated in vacuo
  4. customThe residue was purified by chromatography on silica gel

출처 및 근거

ORD 기록
ord-b267b7cd89aa48ec92b81d806e93f97a
출처 데이터셋
uspto-grants-2001_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06300344B1

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