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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 388181생성일: 2026년 10월 25일

Hexachlorodisilane → Hexakis(dimethylamino) disilane

https://huagongshe.com/reaction/388181

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참여 물질

역할이름HCID투입량
반응물HexachlorodisilaneHCID 83497—
반응물Lithium N-methylmethanaminideHCID 5152226—
반응물(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-1-[4-[4-[4-[(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-3-methylpentanoyl]piperazin-1-yl]-6-[2-[2-(2-prop-2-ynoxyethoxy)ethoxy]ethylamino]-1,3,5-triazin-2-yl]piperazin-1-yl]-3-methylpentan-1-one;hydrochlorideHCID 16745346—
반응물Pentakis(dimethylamino) chloro disilaneHCID 86638304—
용매HexaneHCID 8058—
생성물Hexakis(dimethylamino) disilaneHCID 22053281—

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온도0 °C

반응 단계

The synthesis of ClSi2(NMe2)5 has been done from the ammonolysis of hexachlorodisilane and lithium dimethylamide. Hexachlorodisilane (HCD) is used as the starting material so that the Si—Si direct bond remains in the molecule. n-hexane is used as a solvent and cooled at 0° C. A mixture of pentakis(dimethylamino) chloro disilane and hexakis(dimethylamino) disilane is obtained. Lithium dimethylamide is added to form a “lithium dimethylamide solution”. HCD is added dropwise in the 0° C. lithium dimethylamide solution. Then the solution is stirred for 2 h at 0° C. then for 15 h at RT. The salt LiCl is then removed from the solution, and the n-hexane removed in vacuo. The resulting ClSi2(NMe2)5 and other byproducts are separated by fractional distillation. The NMR spectra indicates that the samples obtained from this distillation process contain less than 5% vol of Si2(NMe2)6.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US08377511B2
출처 데이터셋uspto-grants-2013_02
ORD IDord-3de5682d66d94f2b8b4f54e227e81f6c
출처 메모uspto-grants-2013_02