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2-Chloropyridine → Ethyl 4,8-diethoxy-2-methylquinoline-6-carboxylate

HRID 402779
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HRID 402779 반응식
[C:1]([NH:4][C:5]1[CH:15]=[CH:14][C:8]([C:9]([O:11][CH2:12][CH3:13])=[O:10])=[CH:7][C:6]=1[O:16][CH2:17][CH3:18])(=O)[CH3:2].ClC1C=CC=CN=1.S(OS(C(F)(F)F)(=O)=O)(C(F)(F)F)(=O)=O.[C:41]([O:43][CH2:44][CH3:45])#[CH:42]>C(Cl)Cl>[CH2:41]([O:43][C:44]1[C:15]2[C:5](=[C:6]([O:16][CH2:17][CH3:18])[CH:7]=[C:8]([C:9]([O:11][CH2:12][CH3:13])=[O:10])[CH:14]=2)[N:4]=[C:1]([CH3:2])[CH:45]=1)[CH3:42]
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참가 물질

6

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HCID 79772-ChloropyridineHCID 61239Ether, ethyl ethynylHCID 67749Trifluoromethanesulfonic anhydrideHCID 66765155Ethyl 4-(acetylamino)-3-ethoxybenzoate

생성물 1

HCID 86685267Ethyl 4,8-diethoxy-2-methylquinoline-6-carboxylate수율 8.2%

시약·촉매·용매 1

HCID 6344
Dichloromethane
용매

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온도
-78 °C

실험 절차

To a nitrogen flushed vial were added ethyl 4-(acetylamino)-3-ethoxybenzoate (100 mg, 0.40 mmol), 2-chloropyridine (90 mg, 0.80 mmol) and CH2Cl2 (2 mL). Triflic anhydride (0.40 mmol) was added via a syringe at −78° C. The reaction mixture was stirred at −78° C. for 5 minutes. Ethyl ethynyl ether (0.174 mL, 40% in hexanes, 0.80 mmol) was added. The resulting reaction mixture was allowed to warm to room temperature and was stirred at room temperature for 1 hour. The reaction was quenched by addition of Na2CO3 (5 mL, sat'd.), water (20 mL) and EtOAc (20 mL). The layers were separated and the organic layer was dried over Na2SO4, filtered and concentrated. The crude product was purified on a silica gel column eluting with a gradient of 10-20% EtOAc/hexanes to give the title intermediate (10 mg) as a light brown sticky material.

후처리

  1. customThe resulting reaction mixture
  2. temperatureto warm to room temperature
  3. stirringwas stirred at room temperature for 1 hour
  4. customThe reaction was quenched by addition of Na2CO3 (5 mL, sat'd.), water (20 mL) and EtOAc (20 mL)
  5. customThe layers were separated
  6. dry with materialthe organic layer was dried over Na2SO4
  7. filtrationfiltered
  8. concentrationconcentrated
  9. customThe crude product was purified on a silica gel column
  10. washeluting with a gradient of 10-20% EtOAc/hexanes

출처 및 근거

ORD 기록
ord-44747b426bc44f71a9cbce964db4a0c7
출처 데이터셋
uspto-grants-2014_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08742110B2

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