Triethylamine → N-heptyl-N-ethyladipamic acid, methyl ester

HRID 439759

반응식

HRID 439759 반응식
[CH2:1]([NH:8][CH2:9][CH3:10])[CH2:2][CH2:3][CH2:4][CH2:5][CH2:6][CH3:7].CCN(CC)CC.[CH3:18][O:19][C:20](=[O:28])[CH2:21][CH2:22][CH2:23][CH2:24][C:25](Cl)=[O:26]>C(Cl)Cl>[CH2:1]([N:8]([CH2:9][CH3:10])[C:25](=[O:26])[CH2:24][CH2:23][CH2:22][CH2:21][C:20]([O:19][CH3:18])=[O:28])[CH2:2][CH2:3][CH2:4][CH2:5][CH2:6][CH3:7]

참가 물질

5

실험 절차

To a solution of 3.2 gms of the N-heptyl-N-ethylamine in 96 ml of CH2Cl2 are added 5.7 ml of Et3N followed by 3.63 ml of hexanedioic acid monochloride monomethyl ester. This mixture is stirred at room temperature for 18 hours; and after concentrating under vacuum, the residue obtained is partitioned between ethyl acetate and an aqueous 2N HCl solution. The organic layer is separated and washed with aqueous saturated NaHCO3, then brine, and dried over MgSO4. Following filtration and concentration under vacuum, the residue is flash chromatographed on normal phase silica gel using a 3/1 ratio of hexane and ethyl acetate to yield N-heptyl-N-ethyladipamic acid, methyl ester.

후처리

  1. concentrationand after concentrating under vacuum
  2. customthe residue obtained
  3. customis partitioned between ethyl acetate
  4. customThe organic layer is separated
  5. washwashed with aqueous saturated NaHCO3
  6. dry with materialbrine, and dried over MgSO4
  7. filtrationfiltration and concentration under vacuum
  8. customchromatographed on normal phase silica gel using a 3/1 ratio of hexane and ethyl acetate

출처 및 근거

ORD 기록
ord-203d5b99b48d4890ad718cc6850bb070
출처 데이터셋
uspto-grants-1996_05
특허 번호
US05516767

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