Acetic Acid → N-Cyclopropyl-4-methoxy-2,6-dimethyl-N-{[4-({4-[(2-methylpyridin-4-yl)methyl]piperazin-1-yl}carbonyl)-1,3-oxazol-2-yl]methyl}benzenesulfonamide

HRID 469081노트

반응식

HRID 469081 반응식
[CH:1]1([N:4]([CH2:18][C:19]2[O:20][CH:21]=[C:22]([C:24]([N:26]3[CH2:31][CH2:30][NH:29][CH2:28][CH2:27]3)=[O:25])[N:23]=2)[S:5]([C:8]2[C:13]([CH3:14])=[CH:12][C:11]([O:15][CH3:16])=[CH:10][C:9]=2[CH3:17])(=[O:7])=[O:6])[CH2:3][CH2:2]1.[CH3:32][C:33]1[N:38]=[CH:37][CH:36]=[C:35]([CH:39]=O)[CH:34]=1.CC(O)=O>ClCCCl>[CH:1]1([N:4]([CH2:18][C:19]2[O:20][CH:21]=[C:22]([C:24]([N:26]3[CH2:31][CH2:30][N:29]([CH2:39][C:35]4[CH:36]=[CH:37][N:38]=[C:33]([CH3:32])[CH:34]=4)[CH2:28][CH2:27]3)=[O:25])[N:23]=2)[S:5]([C:8]2[C:9]([CH3:17])=[CH:10][C:11]([O:15][CH3:16])=[CH:12][C:13]=2[CH3:14])(=[O:6])=[O:7])[CH2:2][CH2:3]1

참가 물질

5

반응물 3

HCID 176Acetic AcidHCID 27630002-METHYLISONICOTINALDEHYDEHCID 58392961N-cyclopropyl-4-methoxy-2,6-dimethyl-N-{[4-(piperazin-1-ylcarbonyl)-1,3-oxazol-2-yl]methyl}benzenesulfonamide

생성물 1

HCID 58393121N-Cyclopropyl-4-methoxy-2,6-dimethyl-N-{[4-({4-[(2-methylpyridin-4-yl)methyl]piperazin-1-yl}carbonyl)-1,3-oxazol-2-yl]methyl}benzenesulfonamide

시약·촉매·용매 1

HCID 111,2-Dichloroethane용매

실험 절차

To a stirred solution of N-cyclopropyl-4-methoxy-2,6-dimethyl-N-{[4-(piperazin-1-ylcarbonyl)-1,3-oxazol-2-yl]methyl}benzenesulfonamide (30 mg, 0.07 mmol) in DCE (2 mL) were added 6-methyl-4-pyridinecarboxaldehyde (10 mg, 0.08 mmol) and AcOH (3 μL, 0.07 mmol) and the reaction mixture was stirred for 1 h at ambient temperature. STAB (20 mg, 0.09 mmol) was added and the reaction was stirred for 16 h. The reaction mixture was quenched with H2O (2 mL) and extracted with DCM (3×2 mL). The organic layer was dried over Na2SO4 and concentrated in vacuo. The resulting residue was purified using prep method D to afford the title compound.

후처리

  1. additionSTAB (20 mg, 0.09 mmol) was added
  2. stirringthe reaction was stirred for 16 h
  3. customThe reaction mixture was quenched with H2O (2 mL)
  4. extractionextracted with DCM (3×2 mL)
  5. dry with materialThe organic layer was dried over Na2SO4
  6. concentrationconcentrated in vacuo
  7. customThe resulting residue was purified

출처 및 근거

ORD 기록
ord-b6b9c452cc3f4d4bb91caf83db590e06
출처 데이터셋
uspto-grants-2014_01
특허 번호
US08623859B2

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