Water → 1-Cyclopropyl-4-nitronaphthalene

HRID 473273

반응식

HRID 473273 반응식
[N:1]([O-:3])=[O:2].[Na+].[CH:5]1([C:8]2[C:17]3[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=3)[CH:11]=[CH:10][CH:9]=2)[CH2:7][CH2:6]1.O>C(OCC)(=O)C>[CH:5]1([C:8]2[C:17]3[C:12](=[CH:13][CH:14]=[CH:15][CH:16]=3)[C:11]([N+:1]([O-:3])=[O:2])=[CH:10][CH:9]=2)[CH2:7][CH2:6]1

참가 물질

5

반응물 3

HCID 962WaterHCID 146686931-CyclopropylnaphthaleneHCID 23668193Sodium Nitrite

생성물 1

HCID 598130791-Cyclopropyl-4-nitronaphthalene수율 64%

시약·촉매·용매 1

HCID 8857Ethyl Acetate용매

반응 조건

온도
0 °C

실험 절차

Sodium nitrite (30 mL) was slowly added (over 2 hours) to 1-cyclopropylnaphthalene (6.4 g, 38 mmol) stirred at 0° C. The reaction mixture was stirred at 0° C. for an extra 30 min and then slowly poured into ice. Water was added, followed by ethyl acetate. After extraction, the organic layer was washed with aqueous sodium hydroxide (1%) and water, dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was purified by silica gel chromatography to yield 1-cyclopropyl-4-nitronaphthalene (5.2 g, 64%).

후처리

  1. stirringThe reaction mixture was stirred at 0° C. for an extra 30 min
  2. additionslowly poured into ice
  3. extractionAfter extraction
  4. washthe organic layer was washed with aqueous sodium hydroxide (1%) and water
  5. dry with materialdried over sodium sulfate
  6. filtrationfiltered
  7. concentrationconcentrated under reduced pressure
  8. customThe residue was purified by silica gel chromatography

출처 및 근거

ORD 기록
ord-d04440084aed478abddfcaa83996bf61
출처 데이터셋
uspto-grants-2014_01
특허 번호
US08633232B2

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