Carbon Dioxide → Ammonia

HRID 500629노트

반응식

HRID 500629 반응식
C([Li])CCC.Br[C:7]1[CH:8]=[C:9]([CH:38]=[CH:39][CH:40]=1)[CH2:10][O:11][CH:12]1[CH2:17][CH2:16][N:15]([C:18]([CH3:37])([CH3:36])[CH2:19][CH2:20][C:21]([C:30]2[CH:35]=[CH:34][CH:33]=[CH:32][CH:31]=2)([C:24]2[CH:29]=[CH:28][CH:27]=[CH:26][CH:25]=2)[C:22]#[N:23])[CH2:14][CH2:13]1.C(=O)=O>O1CCCC1>[NH3:15].[CH2:10]([O:11][CH:12]1[CH2:13][CH2:14][N:15]([C:18]([CH3:37])([CH3:36])[CH2:19][CH2:20][C:21]([C:24]2[CH:25]=[CH:26][CH:27]=[CH:28][CH:29]=2)([C:30]2[CH:31]=[CH:32][CH:33]=[CH:34][CH:35]=2)[C:22]#[N:23])[CH2:16][CH2:17]1)[C:9]1[CH:8]=[CH:7][CH:40]=[CH:39][CH:38]=1

참가 물질

6

반응물 3

HCID 280Carbon DioxideHCID 59423969HCID 59423969, 화합물HCID 178418339Butyllithium

생성물 2

HCID 222AmmoniaHCID 59423905HCID 59423905, 화합물

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매

반응 조건

온도
-78 °C

실험 절차

n-Butyl lithium (2.5M in hexanes, 0.23 mL, 0.56 mmol) was added dropwise to a solution of the product of example 87 (200 mg, 0.38 mmol) in tetrahydrofuran (8 mL), cooled to −78° C., and the mixture was stirred for 30 minutes. Carbon dioxide was then passed through the solution, with stirring at −78° C., for 3.5 hours before the mixture was allowed to warm to room temperature. The reaction mixture was concentrated in vacuo and the residue was partitioned between ethyl acetate (30 mL) and water (20 mL). The organic layer was separated, washed with water, dried over magnesium sulfate and concentrated in vacuo. Purification of the residue by column chromatography on silica gel, eluting with dichloromethane:methanol:0.88 ammonia, 100:0:0 to 98:2:0.2, afforded the title compound as a by-product, as an off white solid in 68% yield, 116 mg.

후처리

  1. stirringwith stirring at −78° C., for 3.5 hours before the mixture
  2. temperatureto warm to room temperature
  3. concentrationThe reaction mixture was concentrated in vacuo
  4. customthe residue was partitioned between ethyl acetate (30 mL) and water (20 mL)
  5. customThe organic layer was separated
  6. washwashed with water
  7. dry with materialdried over magnesium sulfate
  8. concentrationconcentrated in vacuo
  9. customPurification of the residue by column chromatography on silica gel
  10. washeluting with dichloromethane

출처 및 근거

ORD 기록
ord-62d8c2d0c5ad458ab00c62a1c6fa3deb
출처 데이터셋
uspto-grants-2010_08
특허 번호
US07772223B2

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