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Trifluoroacetic acid → HCID 68463403, 화합물

HRID 502621
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HRID 502621 반응식
O[C:2]([C:5]1[C:6]([OH:17])=[CH:7][C:8]2[C:13]([CH:14]=1)=[CH:12][C:11]([O:15][CH3:16])=[CH:10][CH:9]=2)([CH3:4])[CH3:3].C([SiH](CC)CC)C.FC(F)(F)C(O)=O>ClCCl>[CH:2]([C:5]1[C:6]([OH:17])=[CH:7][C:8]2[C:13]([CH:14]=1)=[CH:12][C:11]([O:15][CH3:16])=[CH:10][CH:9]=2)([CH3:4])[CH3:3]
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참가 물질

5

반응물 3

HCID 6422Trifluoroacetic acidHCID 12052TriethylsilaneHCID 68458034HCID 68458034, 화합물

생성물 1

HCID 68463403HCID 68463403, 화합물수율 53.7%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a stirring solution of 3-(1-hydroxy-1-methyl-ethyl)-6-methoxy-naphthalen-2-ol (2.4 g, 10.33 mmol) in 50 mL dichloromethane at room temperature under nitrogen atmosphere, was added triethyl silane (16.5 mL, 103.3 mmol) followed by trifluoroacetic acid (7.96 mL, 103.3 mmol). The reaction mixture was stirred for 40 minutes, after which solvent was removed under reduced pressure. The residue was partitioned between dichloromethane and saturated aqueous potassium carbonate solution. The organic layer was washed with water and brine, dried (Na2SO4), filtered and concentrated under reduced pressure to give 1.2 g of 3-isopropyl-6-methoxy-naphthalen-2-ol as an oil.

후처리

  1. customafter which solvent was removed under reduced pressure
  2. customThe residue was partitioned between dichloromethane and saturated aqueous potassium carbonate solution
  3. washThe organic layer was washed with water and brine
  4. dry with materialdried (Na2SO4)
  5. filtrationfiltered
  6. concentrationconcentrated under reduced pressure

출처 및 근거

ORD 기록
ord-173d1e1db2ff42418272c0fd395de31a
출처 데이터셋
uspto-grants-2010_08
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07776872B2

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