홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Trifluoroacetic acid → Trifluoroacetic acid

HRID 505579
노트
인쇄 미리보기

반응식

HRID 505579 반응식
C(OC(=O)[NH:7][C:8]1[CH:13]=[C:12]([CH3:14])[C:11]([N:15]([CH2:18][CH3:19])[CH2:16][CH3:17])=[CH:10][C:9]=1[CH3:20])(C)(C)C.[F:22][C:23]([F:28])([F:27])[C:24]([OH:26])=[O:25]>ClCCl>[CH2:18]([N:15]([CH2:16][CH3:17])[C:11]1[CH:10]=[C:9]([CH3:20])[C:8]([NH2:7])=[CH:13][C:12]=1[CH3:14])[CH3:19].[C:24]([OH:26])([C:23]([F:28])([F:27])[F:22])=[O:25]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 2

HCID 6422Trifluoroacetic acidHCID 66758160HCID 66758160, 화합물

생성물 2

HCID 6422Trifluoroacetic acid수율 100%HCID 437491HCID 437491, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a solution of 41 in 2 mL dichoromethane, trifloroacetic acid (1 mL) was added. The reaction mixture was stirred for 2 h. At this point, LC-MS showed the reaction to be complete. The reaction was concentrated to remove the solvent and most of the TFA. The residue was then dried further in a high vacuum oven over 24 h to give the title compound 42 as TFA salt (100% yield).

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트

후처리

  1. customthe reaction
  2. concentrationThe reaction was concentrated
  3. customto remove the solvent
  4. customThe residue was then dried further in a high vacuum oven over 24 h

출처 및 근거

ORD 기록
ord-3c103e5594d247c48fc61d6231bd5c2b
출처 데이터셋
uspto-grants-2010_08
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07781442B2

반응 노트

불러오는 중…