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Cesium carbonate → HCID 178472425, 화합물

HRID 518633
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HRID 518633 반응식
Cl[C:2]1[CH:7]=[C:6]([NH:8][C@@H:9]2[CH2:14][CH2:13][C@H:12]([C:15]([OH:17])=[O:16])[CH2:11][CH2:10]2)[C:5]([N+:18]([O-:20])=[O:19])=[CH:4][N:3]=1.[CH2:21]([O:28][CH2:29][CH2:30][OH:31])[C:22]1[CH:27]=[CH:26][CH:25]=[CH:24][CH:23]=1.C(=O)([O-])[O-].[Cs+].[Cs+].[CH2:38]1OCCOCCOCCOCCOCCO[CH2:39]1.S(Cl)(Cl)=O>C1(C)C=CC=CC=1>[CH2:21]([O:28][CH2:29][CH2:30][O:31][C:2]1[CH:7]=[C:6]([NH:8][C@@H:9]2[CH2:14][CH2:13][C@H:12]([C:15]([O:17][CH2:38][CH3:39])=[O:16])[CH2:11][CH2:10]2)[C:5]([N+:18]([O-:20])=[O:19])=[CH:4][N:3]=1)[C:22]1[CH:27]=[CH:26][CH:25]=[CH:24][CH:23]=1
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참가 물질

7

반응물 5

HCID 10796Cesium carbonateHCID 121412-(Benzyloxy) ethanolHCID 24386Thionyl ChlorideHCID 2855718-Crown-6HCID 178525752HCID 178525752, 화합물

생성물 1

HCID 178472425HCID 178472425, 화합물수율 76%

시약·촉매·용매 1

HCID 1140
Toluene
용매

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온도
75 °C

실험 절차

To a suspension of cis-4-(2-chloro-5-nitropyridin-4-ylamino)cyclohexanecarboxylic acid (5 g, 16.68 mmol) in toluene (111 mL) was added 2-(benzyloxy)ethanol (7.62 g, 50.0 mmol), cesium carbonate (16.31 g, 50.0 mmol), and 18-crown-6 (6.61 g, 25.02 mmol). The resulting mixture was purged with argon and stirred at 75° C. overnight. The mixture was allowed to cool to RT and diluted with EtOAc to about 150 mL total volume and washed sequentially with brine (2-150 mL), aqueous NH4Cl (2-150 mL) and water (150 mL). The organic phase was collected, dried over sodium sulfate and concentrated under reduced pressure. The residue was suspended in EtOH (111 mL) and thionyl chloride (36.5 mL, 500 mmol) was added dropwise via syringe. The reaction mixture was stirred at RT for 16 hours. The mixture was concentrated to ⅓ volume and diluted with DCM (150 mL). The organic portion was washed with aqueous NaHCO3 (100 mL), dried over sodium sulfate and concentrated. The residue was purified by silica gel chromatography (10-50% EtOAc/Hexanes) to afford cis-ethyl 4-(2-(2-(benzyloxy)ethoxy)-5-nitropyridin-4-ylamino)cyclohexanecarboxylate (5.6 g, 76% yield). MS m/z=444.2 [M+H]. Calc'd for C23H29N3O6: 443.2.

후처리

  1. customThe resulting mixture was purged with argon
  2. temperatureto cool to RT
  3. additiondiluted with EtOAc to about 150 mL total volume
  4. washwashed sequentially with brine (2-150 mL), aqueous NH4Cl (2-150 mL) and water (150 mL)
  5. customThe organic phase was collected
  6. dry with materialdried over sodium sulfate
  7. concentrationconcentrated under reduced pressure
  8. stirringThe reaction mixture was stirred at RT for 16 hours
  9. concentrationThe mixture was concentrated
  10. additiondiluted with DCM (150 mL)
  11. washThe organic portion was washed with aqueous NaHCO3 (100 mL)
  12. dry with materialdried over sodium sulfate
  13. concentrationconcentrated
  14. customThe residue was purified by silica gel chromatography (10-50% EtOAc/Hexanes)

출처 및 근거

ORD 기록
ord-515aad16511f4b0c88e936056505780b
출처 데이터셋
uspto-grants-2015_08
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09115127B2

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