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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 522535생성일: 2026년 10월 26일

Trifluoromethane → HCID 89157714, 화합물

https://huagongshe.com/reaction/522535

반응식

참여 물질

역할이름HCID투입량
반응물TrifluoromethaneHCID 6373—
반응물DiethyldichlorosilaneHCID 15589—
반응물Potassium bis(trimethylsilyl)amideHCID 3251421—
생성물HCID 89157714HCID 8915771444%

반응 단계

A similar procedure to the one reported in EXAMPLE 2 was followed except dichlorodiethylsilane (5.12 g, 32.5 mmol, 1 eq) was used as the substrate along with 2eq each of CF3H and KHMDS to obtain pure diethyl bis(trifluoromethyl)silane 3.2 g, 44% yield. 1H NMR (400 MHz): δ 1.08 (m, CH2), 1.16 (m, CH3); 13C NMR (100.5 MHz): δ-1.10 (s, CH2), 5.55 (s, CH3), 128.6 (qq, 1JC—F=319 Hz, 3.35 Hz, CF3); 19F NMR (376.3 MHz): δ-60.2 (s); 29Si NMR (79.5 MHz): δ-2.43 (sept, 2JSi—F=39.4 Hz, 1 Si).

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US09334253B2
출처 데이터셋uspto-grants-2016_05
ORD IDord-91a391a409d645d0944cba77728e9673
출처 메모uspto-grants-2016_05