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1,1'-(Chlorophenylmethylene)bis(4-methoxybenzene) → HCID 86658528, 화합물

HRID 537079
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HRID 537079 반응식
[NH2:1][C:2]1[N:10]=[C:9]2[C:5]([N:6]=[CH:7][N:8]2[C@@H:11]2[O:15][C@H:14]([CH2:16][OH:17])[C@@H:13]([OH:18])[C@:12]2([F:20])[CH3:19])=[C:4]([O:21][CH3:22])[N:3]=1.[C:23](Cl)([C:40]1[CH:45]=[CH:44][CH:43]=[CH:42][CH:41]=1)([C:32]1[CH:39]=[CH:38][C:35]([O:36][CH3:37])=[CH:34][CH:33]=1)[C:24]1[CH:31]=[CH:30][C:27]([O:28][CH3:29])=[CH:26][CH:25]=1>N1C=CC=CC=1>[CH3:29][O:28][C:27]1[CH:30]=[CH:31][C:24]([C:23]([C:32]2[CH:39]=[CH:38][C:35]([O:36][CH3:37])=[CH:34][CH:33]=2)([C:40]2[CH:45]=[CH:44][CH:43]=[CH:42][CH:41]=2)[O:17][CH2:16][C@@H:14]2[C@@H:13]([OH:18])[C@:12]([F:20])([CH3:19])[C@H:11]([N:8]3[CH:7]=[N:6][C:5]4[C:9]3=[N:10][C:2]([NH:1][C:23]([C:24]3[CH:31]=[CH:30][C:27]([O:28][CH3:29])=[CH:26][CH:25]=3)([C:32]3[CH:39]=[CH:38][C:35]([O:36][CH3:37])=[CH:34][CH:33]=3)[C:40]3[CH:41]=[CH:42][CH:43]=[CH:44][CH:45]=3)=[N:3][C:4]=4[O:21][CH3:22])[O:15]2)=[CH:25][CH:26]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 968311,1'-(Chlorophenylmethylene)bis(4-methoxybenzene)HCID 46844020(2'R)-2'-Deoxy-2'-fluoro-2'-methyl-6-O-methylguanosine

생성물 1

HCID 86658528HCID 86658528, 화합물

시약·촉매·용매 1

HCID 1049Pyridine용매

실험 절차

To a solution of (2R,3R,4R,5R)-5-(2-amino-6-methoxy-9H-purin-9-yl)-4-fluoro-2-(hydroxymethyl)-4-methyltetrahydrofuran-3-ol (9a, 4 g, 12.8 mmol) in anhydrous pyridine (100 mL) cooled at 0° C. was added DMT-Cl portion-wise under nitrogen. The brown solution was stirred at ambient temperature for 24 hours. The mixture was concentrated under reduced pressure to remove most of solvent and sat. NaHCO3 (20 mL) was added. The mixture was diluted with water (150 mL) and EtOAc (120 mL). The organic layer was separated and washed with water (5×120 mL), brine and dried over Na2SO4. After removal of solvent, the residue was purified via column chromatography (20% EA in hexanes to 80% EA in hexanes) to afford 11.6 g of product, 114, as a white foam solid (quantitative yield).

후처리

  1. concentrationThe mixture was concentrated under reduced pressure
  2. customto remove most of solvent and sat. NaHCO3 (20 mL)
  3. additionwas added
  4. additionThe mixture was diluted with water (150 mL) and EtOAc (120 mL)
  5. customThe organic layer was separated
  6. washwashed with water (5×120 mL), brine
  7. dry with materialdried over Na2SO4
  8. customAfter removal of solvent
  9. customthe residue was purified via column chromatography (20% EA in hexanes to 80% EA in hexanes)

출처 및 근거

ORD 기록
ord-c2b0e08129444981ba983b7ba42b1b4c
출처 데이터셋
uspto-grants-2014_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08859756B2

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