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Pyridine → N-Phenyl-3-difluoromethyl-5-trifluoromethyl-4-pyrazolecarboxylic acid ethyl ester

HRID 626281
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HRID 626281 반응식
B(F)(F)F.CCOCC.C[N:11]([C:13](F)(F)[CH:14]([F:16])[F:15])C.[F:19][C:20]([F:30])([F:29])[C:21](=O)[CH2:22][C:23]([O:25][CH2:26][CH3:27])=[O:24].N1C=CC=CC=1.[C:37]1([NH:43]N)[CH:42]=[CH:41][CH:40]=[CH:39][CH:38]=1>ClCCl.C(#N)C>[CH2:26]([O:25][C:23]([C:22]1[C:13]([CH:14]([F:16])[F:15])=[N:11][N:43]([C:37]2[CH:42]=[CH:41][CH:40]=[CH:39][CH:38]=2)[C:21]=1[C:20]([F:30])([F:29])[F:19])=[O:24])[CH3:27]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

8

반응물 5

HCID 1049PyridineHCID 7516PhenylhydrazineHCID 8000Boron trifluoride etherateHCID 67793Ethyl 4,4,4-trifluoroacetoacetateHCID 21945697Ethanamine, 1,1,2,2-tetrafluoro-N,N-dimethyl-

생성물 1

HCID 71770119N-Phenyl-3-difluoromethyl-5-trifluoromethyl-4-pyrazolecarboxylic acid ethyl ester
수율 67%

시약·촉매·용매 2

HCID 6342Acetonitrile용매HCID 6344Dichloromethane용매2회

실험 절차

BF3.OEt2 (2.5 ml, 20.0 mmol) was added to a solution of TFEDMA (2.4 ml, 20.0 mmol) in dry dichloromethane (20 ml) under argon in a Teflon flask. The solution was stirred at room temperature for 15 min, before the dichloromethane was removed under reduced pressure. The residue was then taken up in dry acetonitrile (20 ml). In a second Teflon flask, ethyl 4,4,4-trifluoroacetoacetate (2.8 ml, 20.0 mmol) was added to a solution of pyridine (4.7 g, 60.0 mmol) in dry acetonitrile (40 ml) and the mixture was stirred at room temperature for 15 min. To this were added dropwise, at −30° C., the contents of the first flask. The reaction mixture was brought to room temperature in the cold bath and stirred overnight. Phenyl hydrazine (3.0 ml, 30.0 mmol) was then added dropwise at room temperature and the mixture was stirred overnight. The solvent was removed under reduced pressure and the residue was purified by flash chromatography on silica gel with a pentanes/diethyl ether mixture (9:1). N-Phenyl-3-difluoromethyl-5-trifluoromethyl-4-pyrazolecarboxylic acid ethyl ester (4.47 g, 13.4 mmol, 67%) was isolated as a colourless solid.

후처리

  1. customwas removed under reduced pressure
  2. additionTo this were added dropwise, at −30° C.
  3. customwas brought to room temperature in the cold bath
  4. stirringstirred overnight
  5. stirringthe mixture was stirred overnight
  6. customThe solvent was removed under reduced pressure
  7. customthe residue was purified by flash chromatography on silica gel with a pentanes/diethyl ether mixture (9:1)

출처 및 근거

ORD 기록
ord-29799054fa644287b0e0afc9c342d9dd
출처 데이터셋
uspto-grants-2016_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09309202B2

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