참여 물질
| 역할 | 이름 | HCID | 투입량 |
|---|
| 반응물 | Acetylene | HCID 6326 | — |
| 반응물 | Silane | HCID 23953 | — |
| 반응물 | N,N,N',N',N'',N''-Hexamethylsilanetriamine | HCID 84795 | — |
| 촉매 | Chloroplatinic acid | HCID 61859 | — |
| 생성물 | 1-Ethyl-N,N,N',N',N'',N''-hexamethylsilanetriamine | HCID 207257 | — |
반응 단계
A two liter stirred batch reactor was purged with nitrogen gas and thereafter charged with 840 g (5.22 moles) of tris(dimethylamino)silane and 5 ppm hexachloroplatinic acid. The reactor was then pressurized to approximately 5 psig with nitrogen gas and heated to approximately 250° C. The acetylene inlet feed was started and maintained at 100 psig. The reaction temperature was maintained at 250° C. After four hours the acetylene flow was stopped, the reaction mix cooled and the reaction products analyzed. Vinyltris(dimethyl)amino)silane was the single major product at 90% of theoretical. Ethyltris(dimethylamino)silane and 1,2-bis(trisdimethylamino)silylethane by-products were formed in amounts less than 0.5% each. Vinyltris(dimethylamino)silane polymer was also formed in an amount of 7-8%.
출처 및 근거
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| 특허 번호 | US04558146 |
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| 출처 데이터셋 | uspto-grants-1985_12 |
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| ORD ID | ord-f19a773dbde64e59b5890b82eeed2fcc |
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| 출처 메모 | uspto-grants-1985_12 |
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