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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 637805생성일: 2026년 10월 26일

Acetylene → 1-Ethyl-N,N,N',N',N'',N''-hexamethylsilanetriamine

https://huagongshe.com/reaction/637805

반응식

참여 물질

역할이름HCID투입량
반응물AcetyleneHCID 6326—
반응물SilaneHCID 23953—
반응물N,N,N',N',N'',N''-HexamethylsilanetriamineHCID 84795—
촉매Chloroplatinic acidHCID 61859—
생성물1-Ethyl-N,N,N',N',N'',N''-hexamethylsilanetriamineHCID 207257—

반응 조건

온도250 °C

반응 단계

A two liter stirred batch reactor was purged with nitrogen gas and thereafter charged with 840 g (5.22 moles) of tris(dimethylamino)silane and 5 ppm hexachloroplatinic acid. The reactor was then pressurized to approximately 5 psig with nitrogen gas and heated to approximately 250° C. The acetylene inlet feed was started and maintained at 100 psig. The reaction temperature was maintained at 250° C. After four hours the acetylene flow was stopped, the reaction mix cooled and the reaction products analyzed. Vinyltris(dimethyl)amino)silane was the single major product at 90% of theoretical. Ethyltris(dimethylamino)silane and 1,2-bis(trisdimethylamino)silylethane by-products were formed in amounts less than 0.5% each. Vinyltris(dimethylamino)silane polymer was also formed in an amount of 7-8%.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US04558146
출처 데이터셋uspto-grants-1985_12
ORD IDord-f19a773dbde64e59b5890b82eeed2fcc
출처 메모uspto-grants-1985_12