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1-Hydroxybenzotriazole → HCID 59260987, 화합물

HRID 644309
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HRID 644309 반응식
CN(C(ON1N=NC2C=CC=CC1=2)=[N+](C)C)C.[B-](F)(F)(F)F.C1C=CC2N(O)N=NC=2C=1.[CH3:33][N:34]1[CH2:39][CH2:38][CH:37]([N:40]2[CH2:45][CH2:44][NH:43][CH2:42][CH2:41]2)[CH2:36][CH2:35]1.[CH2:46]([C:48]1[CH:49]=[C:50]([CH2:56][CH:57]([NH:61][C:62]([N:64]2[CH2:69][CH2:68][CH:67]([N:70]3[CH2:79][C:78]4[C:73](=[CH:74][CH:75]=[CH:76][CH:77]=4)[NH:72][C:71]3=[O:80])[CH2:66][CH2:65]2)=[O:63])[C:58](O)=[O:59])[CH:51]=[CH:52][C:53]=1[CH2:54][CH3:55])[CH3:47]>C1COCC1.C(N(CC)CC)C>[CH2:46]([C:48]1[CH:49]=[C:50]([CH:51]=[CH:52][C:53]=1[CH2:54][CH3:55])[CH2:56][CH:57]([NH:61][C:62]([N:64]1[CH2:69][CH2:68][CH:67]([N:70]2[CH2:79][C:78]3[C:73](=[CH:74][CH:75]=[CH:76][CH:77]=3)[NH:72][C:71]2=[O:80])[CH2:66][CH2:65]1)=[O:63])[C:58]([N:43]1[CH2:44][CH2:45][N:40]([CH:37]2[CH2:36][CH2:35][N:34]([CH3:33])[CH2:39][CH2:38]2)[CH2:41][CH2:42]1)=[O:59])[CH3:47]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 757711-HydroxybenzotriazoleHCID 5663241-(1-Methyl-4-piperidinyl)piperazineHCID 2733207O-(Benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborateHCID 68579989HCID 68579989, 화합물

생성물 1

HCID 59260987HCID 59260987, 화합물

시약·촉매·용매 2

HCID 8028
Tetrahydrofuran
용매
HCID 8471Triethylamine용매

반응 조건

온도
40 °C

실험 절차

336 mg (1.05 mmol) of TBTU, 161 mg (1.05 mmol) of HOBt, 1.02 mL triethylamine and 326 mg (1.05 mmol) of 1-(1-methyl-piperidin-4-yl)-piperazine (used as the tris-hydrochloride) were added to a solution of 500 mg (1.05 mmol) of 3-(3,4-diethyl-phenyl)-2-{[4-(2-oxo-1,4-dihydro-2H-quinazolin-3-yl)-piperidine-1-carbonyl]-amino}-propionic acid in 100 mL of THF, stirred for 4 h at RT and 2 h at 40° C. The solvent was removed in vacuo, the residue was stirred with 40 mL of saturated NaHCO3 solution, the precipitated product was suction filtered, taken up in MeOH and purified by chromatography over silica gel (MeOH). The product fractions were evaporated down, the residue triturated with diethyl ether, suction filtered, washed twice with diethyl ether and dried.

후처리

  1. customThe solvent was removed in vacuo
  2. stirringthe residue was stirred with 40 mL of saturated NaHCO3 solution
  3. filtrationfiltered
  4. custompurified by chromatography over silica gel (MeOH)
  5. customThe product fractions were evaporated down
  6. customthe residue triturated with diethyl ether, suction
  7. filtrationfiltered
  8. washwashed twice with diethyl ether
  9. customdried

출처 및 근거

ORD 기록
ord-78534e91aa684edba3880e1467f0f600
출처 데이터셋
uspto-grants-2010_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07700589B2

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