Sulfuric Acid → 6H-Thieno[2,3-b]thiopyran-2-sulfonamide-7,7-dioxide

HRID 653455

반응식

HRID 653455 반응식
O[CH:2]1[CH2:7][CH2:6][S:5](=[O:9])(=[O:8])[C:4]2[S:10][C:11]([S:13]([NH2:16])(=[O:15])=[O:14])=[CH:12][C:3]1=2.S(=O)(=O)(O)O>FC(F)(F)C(O)=O>[S:10]1[C:4]2[S:5](=[O:8])(=[O:9])[CH2:6][CH:7]=[CH:2][C:3]=2[CH:12]=[C:11]1[S:13]([NH2:16])(=[O:14])=[O:15]

참가 물질

4

반응물 2

HCID 1118Sulfuric AcidHCID 136170125,6-Dihydro-4-hydroxy-4H-thieno[2,3-b]thiopyran-2-sulfonamide 7,7-dioxide

생성물 1

HCID 137631516H-Thieno[2,3-b]thiopyran-2-sulfonamide-7,7-dioxide수율 90%

시약·촉매·용매 1

HCID 6422Trifluoroacetic acid용매

반응 조건

온도
50 °C

실험 절차

A mixture of 5,6-dihydro-4-hydroxy-4H-thieno[2,3-b]thiopyran-2-sulfonamide-7,7-dioxide (0.90 g, 0.0031 m), concentrated sulfuric acid (3 ml), and trifluoroacetic acid (20 ml) was stirred and heated at 50° C. for 20.5 hours. After removal of trifluoroacetic acid under reduced pressure, the residue was dissolved in ethyl acetate (25 ml) and the solution was washed with water, twice with saturated sodium bicarbonate solution, twice more with water and dried over sodium sulfate. The solvent was concentrated in vacuo to yield 0.74 g (90%) of crude product. The product was purified by recrystallization from nitromethane after treatment with decolorizing carbon. An analytical sample melted at 214.5°-216° C. (See Example 26).

후처리

  1. customAfter removal of trifluoroacetic acid under reduced pressure
  2. dissolutionthe residue was dissolved in ethyl acetate (25 ml)
  3. washthe solution was washed with water, twice with saturated sodium bicarbonate solution, twice more with water
  4. dry with materialdried over sodium sulfate
  5. concentrationThe solvent was concentrated in vacuo

출처 및 근거

ORD 기록
ord-3aa79d07ce1b42f2a8f691345ff56674
출처 데이터셋
uspto-grants-1987_06
특허 번호
US04677115

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