Thionyl Chloride → HCID 54281029, 화합물

HRID 65575노트

반응식

HRID 65575 반응식
[CH3:1][C:2]([CH3:28])([CH:6]([N:16]([CH3:27])[S:17]([C:20]1[CH:25]=[CH:24][C:23]([CH3:26])=[CH:22][CH:21]=1)(=[O:19])=[O:18])[CH2:7][C:8]1[CH:13]=[CH:12][C:11]([O:14][CH3:15])=[CH:10][CH:9]=1)[C:3](O)=[O:4].S(Cl)([Cl:31])=O>C1C=CC=CC=1>[CH3:1][C:2]([CH3:28])([CH:6]([N:16]([CH3:27])[S:17]([C:20]1[CH:25]=[CH:24][C:23]([CH3:26])=[CH:22][CH:21]=1)(=[O:19])=[O:18])[CH2:7][C:8]1[CH:13]=[CH:12][C:11]([O:14][CH3:15])=[CH:10][CH:9]=1)[C:3]([Cl:31])=[O:4]

참가 물질

4

반응물 2

HCID 24386Thionyl ChlorideHCID 540446942,2-dimethyl-4-(p-methoxyphenyl)-3-(N-methyl-p-toluenesulfonamido)butyric acid

생성물 1

HCID 54281029HCID 54281029, 화합물

시약·촉매·용매 1

HCID 241Benzene용매

실험 절차

A mixture of 283 g of 2,2-dimethyl-4-(p-methoxyphenyl)-3-(N-methyl-p-toluenesulfonamido)butyric acid, 1500 ml of dry benzene and 430 ml of thionyl chloride is boiled for 3 hours. After removal of volatile material by evaporation in vacuo, the residue is taken up in toluene and the solvent is evaporated in vacuo. This procedure is repeated twice whereafter crystallization of the initially oily product is accomplished by treatment with ether, melting point 110°-111° C.

후처리

  1. customAfter removal of volatile material
  2. customby evaporation in vacuo
  3. customthe solvent is evaporated in vacuo
  4. customThis procedure is repeated twice whereafter crystallization of the initially oily product

출처 및 근거

ORD 기록
ord-aac216a571ae4d2cb8276d5716237763
출처 데이터셋
uspto-grants-1978_12
특허 번호
US04128548

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