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Methanesulfonyl chloride → HCID 86722364, 화합물

HRID 718776
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HRID 718776 반응식
[CH2:1]([O:8][C@@:9]1([C:36]([F:39])([F:38])[F:37])[CH2:33][C@H:13]2[CH2:14][CH2:15][CH2:16][C:17]3[C:18](=[CH:19][C:20]4[CH:21]=[N:22][N:23]([C:26]5[CH:31]=[CH:30][C:29]([F:32])=[CH:28][CH:27]=5)[C:24]=4[CH:25]=3)[C@:12]2([CH2:34][NH2:35])[CH2:11][CH2:10]1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.[CH3:40][S:41](Cl)(=[O:43])=[O:42]>C(Cl)Cl>[CH2:1]([O:8][C@@:9]1([C:36]([F:38])([F:39])[F:37])[CH2:33][C@H:13]2[CH2:14][CH2:15][CH2:16][C:17]3[C:18](=[CH:19][C:20]4[CH:21]=[N:22][N:23]([C:26]5[CH:27]=[CH:28][C:29]([F:32])=[CH:30][CH:31]=5)[C:24]=4[CH:25]=3)[C@:12]2([CH2:34][NH:35][S:41]([CH3:40])(=[O:43])=[O:42])[CH2:11][CH2:10]1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 31297Methanesulfonyl chlorideHCID 86722363HCID 86722363, 화합물

생성물 1

HCID 86722364HCID 86722364, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매2회

실험 절차

Crude ((3R,4aR,12bS)-3-(benzyloxy)-9-(4-fluorophenyl)-3-(trifluoromethyl)-1,2,3,4,4a,5,6,7,9,12b-decahydrobenzo[6,7]cyclohepta[1,2-f]indazol-12b-yl)methan amine (34, R1=4-Fluorophenyl, R3=Trifluoromethyl, R4═H, R3=Benzyl) (0.135 mmol) was dissolved in DCM (3 mL) and methanesulfonyl chloride (0.026 mL, 0.334 mmol) and TEA (0.023 mL, 0.167 mmol) were added at rt. The reaction was stirred at rt for about 30 min, then diluted with DCM (10 mL) and concentrated with silica gel (3 g). The residue was purified on silica gel using a gradient of 0-10% EtOAc in DCM. Product fractions were combined and concentrated to yield N-(((3R,4aR,12bS)-3-(benzyloxy)-9-(4-fluorophenyl)-3-(trifluoromethyl)-1,2,3,4,4a,5,6,7,9,12b-decahydrobenzo[6,7]cyclohepta[1,2-f]indazol-12b-yl)methyl)methanesulfonamide (35, R1=4-Fluorophenyl, R3=Trifluoromethyl, R4=Methanesulfonyl, R3=Benzyl) (40 mg, 39%) as a clear glass; LC/MS, method 3, Rt=2.95 min, MS m/z 616 (M+H)+.) The residue was used in step #4 without further purification.

후처리

  1. concentrationconcentrated with silica gel (3 g)
  2. customThe residue was purified on silica gel using a gradient of 0-10% EtOAc in DCM
  3. concentrationconcentrated

출처 및 근거

ORD 기록
ord-3b71d697b5864a8c991e8eb98ec9f108
출처 데이터셋
uspto-grants-2015_11
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09193744B2

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