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Water → HCID 74221306, 화합물

HRID 718869
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HRID 718869 반응식
[CH2:1]([C@@:3]12[CH2:28][CH2:27][C@@:26]([C:30]([F:33])([F:32])[F:31])([OH:29])[CH2:25][C@H:4]1[CH2:5][CH2:6][CH2:7][C:8]1[C:9]2=[CH:10][C:11]2[CH:12]=[N:13][N:14]([C:17]3[CH:22]=[CH:21][C:20]([S:23][CH3:24])=[CH:19][CH:18]=3)[C:15]=2[CH:16]=1)[CH3:2].[OH2:34].ClC1C=C(C=CC=1)C(OO)=[O:40]>CC(C)=O>[CH2:1]([C@@:3]12[CH2:28][CH2:27][C@@:26]([C:30]([F:33])([F:32])[F:31])([OH:29])[CH2:25][C@H:4]1[CH2:5][CH2:6][CH2:7][C:8]1[C:9]2=[CH:10][C:11]2[CH:12]=[N:13][N:14]([C:17]3[CH:18]=[CH:19][C:20]([S:23]([CH3:24])(=[O:40])=[O:34])=[CH:21][CH:22]=3)[C:15]=2[CH:16]=1)[CH3:2]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 962WaterHCID 70297m-Chloroperbenzoic acidHCID 86722485HCID 86722485, 화합물

생성물 1

HCID 74221306HCID 74221306, 화합물

시약·촉매·용매 1

HCID 180Acetone용매

실험 절차

(3R,4aR,12bR)-12b-Ethyl-9-(4-(methylthio)phenyl)-3-(trifluoromethyl)-1,2,3,4,4a,5,6,7,9,12b-decahydrobenzo[6,7]cyclohepta[1,2-f]indazol-3-ol (11, R1=4-(Methylthio)phenyl, R2=Ethyl, R3=Trifluoromethyl) (230 mg, 0.485 mmol) in acetone (10 mL) and water (2 mL) was treated with 3-chlorobenzoperoxoic acid (543 mg, 2.42 mmol) at rt. After 30 min the mixture was concentrated under reduced pressure then the material was partitioned between sat. aq. NaHCO3 (15 mL), water (15 mL) and EtOAc (30 mL). The organic layer was washed with brine (10 mL), dried over MgSO4 and filtered. The filtrate was concentrated under reduced pressure then the material was purified on silica gel (12 g) using 0-40% EtOAc in DCM. Product fractions were concentrated under reduced pressure then triturated with Et2O (1.5 mL) in heptane (20 mL). The solids were collected by filtration and dried to yield (3R,4aR,12bR)-12b-ethyl-9-(4-(methylsulfonyl)phenyl)-3-(trifluoromethyl)-1,2,3,4,4a,5,6,7,9,12b-decahydrobenzo[6,7]cyclohepta[1,2-f]indazol-3-ol (11, R1=4-(Methylsulfonyl)phenyl, R2=Ethyl, R3=Trifluoromethyl) (110.6 mg, 45.0%); LC/MS, method 2, Rt=2.43 min, MS m/z 507 (M+H)+. 1H NMR (400 MHz, DMSO) δ 8.37 (d, J=0.8 Hz, 1H), 8.14-8.06 (m, 4H), 7.88 (s, 1H), 7.80 (s, 1H), 5.86 (s, 1H), 3.30 (s, 3H), 3.28-3.22 (m, 1H), 3.02-2.97 (m, 1H), 2.29-2.20 (m, 1H), 2.16-1.98 (m, 4H), 1.93-1.75 (m, 2H), 1.73-1.54 (m, 5H), 1.41-1.30 (m, 1H), 0.44 (t, J=7.3 Hz, 3H).

후처리

  1. concentrationAfter 30 min the mixture was concentrated under reduced pressure
  2. customthe material was partitioned between sat. aq. NaHCO3 (15 mL), water (15 mL) and EtOAc (30 mL)
  3. washThe organic layer was washed with brine (10 mL)
  4. dry with materialdried over MgSO4
  5. filtrationfiltered
  6. concentrationThe filtrate was concentrated under reduced pressure
  7. customthe material was purified on silica gel (12 g)
  8. concentrationProduct fractions were concentrated under reduced pressure
  9. customthen triturated with Et2O (1.5 mL) in heptane (20 mL)
  10. filtrationThe solids were collected by filtration
  11. customdried

출처 및 근거

ORD 기록
ord-3fd60bec81c64ff5a906ca93f952c96d
출처 데이터셋
uspto-grants-2015_11
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09193744B2

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