Water → HCID 178461232, 화합물

HRID 81268노트

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HRID 81268 반응식
Cl[C:2]1[C:7]2[N:8]([CH2:20][C@H:21]3[CH2:26][CH2:25][C@H:24]([CH3:27])[CH2:23][CH2:22]3)[C:9]([N:11]3[CH2:16][CH2:15][O:14][C@@H:13]4[CH2:17][CH2:18][CH2:19][C@@H:12]34)=[N:10][C:6]=2[CH:5]=[C:4]([Cl:28])[N:3]=1.[Cl:29][C:30]1[CH:31]=[C:32](B2OC(C)(C)C(C)(C)O2)[C:33]([F:36])=[N:34][CH:35]=1.C([O-])([O-])=O.[Cs+].[Cs+].O>CCOC(C)=O>[Cl:28][C:4]1[N:3]=[C:2]([C:32]2[C:33]([F:36])=[N:34][CH:35]=[C:30]([Cl:29])[CH:31]=2)[C:7]2[N:8]([CH2:20][C@H:21]3[CH2:22][CH2:23][C@H:24]([CH3:27])[CH2:25][CH2:26]3)[C:9]([N:11]3[CH2:16][CH2:15][O:14][C@@H:13]4[CH2:17][CH2:18][CH2:19][C@@H:12]34)=[N:10][C:6]=2[CH:5]=1

참가 물질

6

반응물 4

HCID 962Water2회HCID 10796Cesium carbonateHCID 533983785-Chloro-2-fluoro-3-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)pyridineHCID 178461234HCID 178461234, 화합물

생성물 1

HCID 178461232HCID 178461232, 화합물

시약·촉매·용매 1

HCID 8857Ethyl Acetate용매

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온도
90 °C

실험 절차

4,6-dichloro-2-[(trans)-hexahydrocyclopenta[b][1,4]oxazin-4(4aH)-yl]-3-[(trans-4-methylcyclohexyl)methyl]-3H-imidazo[4,5-c]pyridine (racemic, 422 mg, 1 mmol), 5-chloro-2-fluoro-3-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)pyridine (340 mg, 2 mmol) and Cs2CO3 (980 mg, 3 mmol) were added to degassed dioxane:water (10 mL: 2 mL), followed by the addition of [1,1′-bis(di-tert-butylphosphino)ferrocene]PdCl2 (130 mg, 0.2 mmol). The reaction was heated at 90° C. for 24 hours. Water and EtOAc were added. The aqueous layer was extracted with EtOAc several times. The combined organic layers were dried over anhydrous Na2SO4, filtered, and concentrated in vacuo. The residue was purified on a silica gel column (0 to 60% EtOAc/hexanes) to afford 6-chloro-4-(5-chloro-2-fluoropyridin-3-yl)-2-[(trans)-hexahydrocyclopenta[b][1,4]oxazin-4(4aH)-yl]-3-[(trans-4-methylcyclohexyl)methyl]-3H-imidazo[4,5-c]pyridine (racemic). MS ES calc'd. for C26H30Cl2FN5O [M+H]+ 518. found 518.

후처리

  1. customto degassed dioxane
  2. extractionThe aqueous layer was extracted with EtOAc several times
  3. dry with materialThe combined organic layers were dried over anhydrous Na2SO4
  4. filtrationfiltered
  5. concentrationconcentrated in vacuo
  6. customThe residue was purified on a silica gel column (0 to 60% EtOAc/hexanes)

출처 및 근거

ORD 기록
ord-c789d65199174fb0920133c415d19328
출처 데이터셋
uspto-grants-2014_09
특허 번호
US08846657B2

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