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Boron tribromide → HCID 12019734, 화합물

HRID 843289
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HRID 843289 반응식
[CH2:1]([NH:5][C:6]([C:8]1[C@:9]2([CH2:25][CH2:24][C@H:23]3[C@@H:14]([CH2:15][CH2:16][C:17]4[CH:18]=[C:19]([O:26]C)[CH:20]=[CH:21][C:22]=43)[C@@H:11]2[CH2:12][CH:13]=1)[CH3:10])=[O:7])[CH2:2][CH2:3][CH3:4].B(Br)(Br)Br>C(Cl)Cl>[CH2:1]([NH:5][C:6]([C:8]1[C@:9]2([CH2:25][CH2:24][C@H:23]3[C@@H:14]([CH2:15][CH2:16][C:17]4[CH:18]=[C:19]([OH:26])[CH:20]=[CH:21][C:22]=43)[C@@H:11]2[CH2:12][CH:13]=1)[CH3:10])=[O:7])[CH2:2][CH2:3][CH3:4]
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참가 물질

4

반응물 2

HCID 25134Boron tribromideHCID 12019733HCID 12019733, 화합물

생성물 1

HCID 12019734HCID 12019734, 화합물수율 78%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a solution comprising 119 mg of compound 9a in 2 ml of anhydrous CH2Cl2 was added 0.64 ml of BBr3 (1M solution in CH2Cl2) at −15° C. under nitrogen atmosphere. The reaction solution was stirred at room temperature for 1.3 hours and quenched by adding methanol and water at 0° C. The organic layer was separated and the aqueous layer was extracted with chloroform (CHCl3). The combined organic layer was dried with Na2SO4 and concentrated in vacuo. The residue was triturated with 2.5 ml of EtOAc and 2.5 ml of hexane, yielding compound 10a (89 mg, 78%).

후처리

  1. customquenched
  2. additionby adding methanol and water at 0° C
  3. customThe organic layer was separated
  4. extractionthe aqueous layer was extracted with chloroform (CHCl3)
  5. dry with materialThe combined organic layer was dried with Na2SO4
  6. concentrationconcentrated in vacuo
  7. customThe residue was triturated with 2.5 ml of EtOAc and 2.5 ml of hexane

출처 및 근거

ORD 기록
ord-319372cc515a4380a84e4292c864ddb8
출처 데이터셋
uspto-grants-2002_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06376687B1

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