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Sulfuric Acid → 4-n-Decyloxy-1-naphthol

HRID 904715
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인쇄 미리보기

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HRID 904715 반응식
[CH:1]1[CH:6]=[C:5]2[C:7]([OH:12])=[CH:8][CH:9]=[C:10]([OH:11])[C:4]2=[CH:3][CH:2]=1.[CH2:13](O)[CH2:14][CH2:15][CH2:16][CH2:17][CH2:18][CH2:19][CH2:20][CH2:21][CH3:22].S(=O)(=O)(O)O>C(OCC)(=O)C.O>[CH2:13]([O:12][C:7]1[C:5]2[C:4](=[CH:3][CH:2]=[CH:1][CH:6]=2)[C:10]([OH:11])=[CH:9][CH:8]=1)[CH2:14][CH2:15][CH2:16][CH2:17][CH2:18][CH2:19][CH2:20][CH2:21][CH3:22]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 1118Sulfuric AcidHCID 81741-DecanolHCID 113051,4-Naphthalenediol

생성물 1

HCID 204786024-n-Decyloxy-1-naphthol

시약·촉매·용매 1

HCID 22728543Water ethylacetate용매

반응 조건

온도
50 °C

실험 절차

112 g of naphthohydroquinone and 560 ml of n-decanol were placed in a 1 l three-necked flask and 56 ml of concentrated sulfuric acid was dropwisely added thereto for 30 minutes under nitrogen gas stream while stirring. Thereafter, the mixture was further stirred for 30 minutes and, then, heated at 50° C. for 1 hour and 30 minutes. After cooling, ethyl acetate-water was added to the reaction mixture and the precipitated crystals were filtered off. An aqueous sodium hydroxide solution was added to the filtrate so as to water layer reach pH of 5 to 6. Then, the ethyl acetate layer was washed with water and dried with MgSO4 overnight. The dried ethyl acetate solution was evaporated under reduced pressure to remove ethyl acetate and n-decanol. The residue was dissolved in 1 l of ethyl acetate and treated with 26 g of active carbon followed by concentration under reduced pressure. The residue was recrystallized from a mixed solvent of ethyl acetate and n-hexane and, further, recrystallized from benzene to obtain 73 g of white crystals having a melting point of 89° to 90° C.

후처리

  1. stirringThereafter, the mixture was further stirred for 30 minutes
  2. temperatureAfter cooling
  3. filtrationthe precipitated crystals were filtered off
  4. additionAn aqueous sodium hydroxide solution was added to the filtrate so as to water layer
  5. washThen, the ethyl acetate layer was washed with water
  6. dry with materialdried with MgSO4 overnight
  7. customThe dried ethyl acetate solution was evaporated under reduced pressure
  8. customto remove ethyl acetate and n-decanol
  9. dissolutionThe residue was dissolved in 1 l of ethyl acetate
  10. additiontreated with 26 g of active carbon
  11. concentrationfollowed by concentration under reduced pressure
  12. customThe residue was recrystallized from a mixed solvent of ethyl acetate and n-hexane
  13. customfurther, recrystallized from benzene

출처 및 근거

ORD 기록
ord-06aca79e44b540eca28112d276125b00
출처 데이터셋
uspto-grants-1983_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US04419439

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